Roll-to-roll (R2R) fabrication at the micro and nano scales promises to increase
manufacturing throughput and reduce unit cost while providing avenues for unique product
applications. By exploring the potential of creating 3D structures with a single lithography step
and being able to confirm success in-situ, existing multilayer patterning error can be mitigated,
since 3D features would be created in one step rather than many. This paper demonstrates steps
being taken to combine a R2R 3D nanolithography tool and an atomic force microscopy (AFM)-
based in-line metrology tool into a functional system for patterning precise 3D structures. An
existing manufacturing system will be adapted to pattern complex structures with a flexible PDMS
mask currently being proven on stationary substrates. Modifications to the AFM system will
include a focus on imaging patterns with varying mechanical properties and tailoring the system
to include gathering mechanical information as well as imaging. By mapping surface features, the
AFM tool will identify surface imperfections and predict failure modes occurring within the 3D
structure.Mechanical Engineerin
