Material modifications by ion implantation, dry etching, and micro-fabrication are widely used technologies, all of which are performed in vacuum, since ion beams at energies used in these applications are completely attenuated by foils or by long differentially pumped sections, which ate currently used to interface between vacuum and atmosphere. A novel plasma window, which utilizes a short arc for vacuum-atmosphere interface has been developed. This window provides for sufficient vacuum atmosphere separation, as well as for ion beam propagation through it, thus facilitating non-vacuum ion material modification
