We present the direct heteroepitaxial growth of high-quality InGaAs quantum
dots on silicon, enabling scalable, cost-effective quantum photonics devices
compatible with CMOS technology. GaAs heterostructures are grown on silicon via
a GaP buffer and defect-reducing layers. These epitaxial quantum dots exhibit
optical properties akin to those on traditional GaAs substrates, promising vast
potential for the heteroepitaxy approach. They demonstrate strong multi-photon
suppression with g(2)(τ)=(3.7±0.2)×10−2 and high photon
indistinguishability V=(66±19)% under non-resonance excitation. We achieve
up to (18±1)% photon extraction efficiency with a backside distributed
Bragg mirror, marking a crucial step toward silicon-based quantum
nanophotonics