Characteristics of ferroelectric thin films of nio-bium-doped strontium–bismuth tantalite (SBTN), which were deposited by magnetron sputtering on Pt/TiO2/SiO2/Si substrates, are investigated. To form the ferroelectric structure, deposited films were subjected to subsequent annealing at 700–800°C in an O2 atmosphere. The results of X-ray diffraction showed that the films immediately after the deposition have
an amorphous structure. Annealing at 700–800°C results in the formation of the Aurivillius struc-ture. The dependences of permittivity, residual polariza-tion, and the coercitivity of SBTN films on the modes of subsequent annealing are established. Films with residual polarization 2Pr = 9.2 μC/cm2, coercitivity 2Ec = 157 kV/cm, and leakage current 10–6 A/cm2 are obtained at the annealing temperature of 800°C. The dielectric constant and loss tangent at fre-quency of 1.0 MHz were ε = 152 and tanδ = 0.06. The ferroelectric characteristics allow us to use the SBTN films in the capacitor cell of high density ferroelectric random-access non-volatile memory (FeRAM)
