The galvanomagnetic properties and some structural peculiarities of rf-sputtered alloy films (NI80Fe20)100-xSix at 0<x<30 at. % were studied and compared with the corresponding properties of evaporated films of the same thickness and composition. The content of silicon increased with the increasing of the velocity of deposition and led to the amorphousation of the films. Coercivity decreased with the velocity of growth but it did not depend on the thickness and on the velocity of film deposition. The magnetoresistance ratio Δ g/g of the sputtered films was about three times higher then that of the evaporated films.Galvanometrijska svojstva i neke strukturalne osobenosti tankih slojeva legure (Ni80Fe20)100−xSix načinjenih radiofrekventnim rasprašivanjem sa 0 ≤ x ≤ 30 atomnih postotaka eksperimentalno su proučavani i usporedeni s odgovarajućima svojstvima naparenih slojeva jednake debljine i sastava. Sadržaj silicija je povećavan povećanjem brzine polaganja a slojevi su postajali amorfni. Koercitivnost slojeva se smanjivala s brzinom rasta, ali nije ovisila o debljini i o brzini polaganja sloja. Magnetootporni omjer Δ g/g rasprašenih slojeva bio je oko tri puta veći nego za naparene slojeve
