de Bruijn, Ron

de Goeij, Jens

Jansen, Bas

Leenaars, René

Vermeulen, J.P.M.B.

English

A coupling having a variable stiffness is disclosed. The coupling comprises: a deformable component and a support being movably arranged with respect to each other, wherein the deformable component comprises a viscoelastic material and wherein the support has a recess configured to receive the deformable component, wherein the deformable component is configured to deform in volumetric deformation when, in use, a force is applied to the deformable component, and wherein a shape of the deformable component and a shape of the support are configured such that the variable stiffness gradually increases as a function of an amount of the force. A stage apparatus may comprise the coupling

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 Lithographic apparatus stage couplingCitation for published version (APA):de Goeij, J., de Bruijn, R., Vermeulen, J. P. M. B., Leenaars, R., & Jansen, B. (2023). Lithographic apparatusstage coupling. (Patent No. WO2023078788).https://nl.espacenet.com/publicationDetails/biblio?FT=D&date=20230511&DB=&locale=nl_NL&CC=WO&NR=2023078788A1&KC=A1&ND=4Document status and date:Published: 11/05/2023Document Version:Publisher’s PDF, also known as Version of Record (includes final page, issue and volume numbers)Please check the document version of this publication:• A submitted manuscript is the version of the article upon submission and before peer-review. There can beimportant differences between the submitted version and the official published version of record. Peopleinterested in the research are advised to contact the author for the final version of the publication, or visit theDOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and pagenumbers.Link to publicationGeneral rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright ownersand it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.            • Users may download and print one copy of any publication from the public portal for the purpose of private study or research.            • You may not further distribute the material or use it for any profit-making activity or commercial gain            • You may freely distribute the URL identifying the publication in the public portal.If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the “Taverne” license above, pleasefollow below link for the End User Agreement:www.tue.nl/taverneTake down policyIf you believe that this document breaches copyright please contact us at:openaccess@tue.nlproviding details and we will investigate your claim.Download date: 05. Oct. 2023

Lithographic apparatus stage coupling

https://pure.tue.nl/ws/files/299018746/WO2023078788A1.pdf

Lithographic apparatus stage coupling

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