Aldea, E.

Boieriu, P.

Dinescu, G.

Musa, G.

Sanden, van de, M.C.M.

Schram, D.C.

Severens, R.J.

English

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 CN radical excitation during CNx thin film deposition by RFgenerated plasma beamCitation for published version (APA):Dinescu, G., Aldea, E., Boieriu, P., Musa, G., Severens, R. J., Sanden, van de, M. C. M., & Schram, D. C.(1996). CN radical excitation during CNx thin film deposition by RF generated plasma beam. In Lukac, Kslnar, &Skalny (Eds.), ESCAMPIG 13 : 13th European Sectional Conference on the Atomic and Molecular Physics ofIonized Gases, Poprad, Slovakia, August 27-30, 1996 : Abstracts of invited lectures and contributed papers (pp.345-346). European Physical Society (EPS).Document status and date:Published: 01/01/1996Document Version:Publisher’s PDF, also known as Version of Record (includes final page, issue and volume numbers)Please check the document version of this publication:• A submitted manuscript is the version of the article upon submission and before peer-review. There can beimportant differences between the submitted version and the official published version of record. Peopleinterested in the research are advised to contact the author for the final version of the publication, or visit theDOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and pagenumbers.Link to publicationGeneral rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright ownersand it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.            • Users may download and print one copy of any publication from the public portal for the purpose of private study or research.            • You may not further distribute the material or use it for any profit-making activity or commercial gain            • You may freely distribute the URL identifying the publication in the public portal.If the publication is distributed under the terms of Article 25fa of the Dutch Copyright Act, indicated by the “Taverne” license above, pleasefollow below link for the End User Agreement:www.tue.nl/taverneTake down policyIf you believe that this document breaches copyright please contact us at:openaccess@tue.nlproviding details and we will investigate your claim.Download date: 05. Oct. 2023

CN radical excitation during CNx thin film deposition by RF generated plasma beam

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CN radical excitation during CNx thin film deposition by RF generated plasma beam

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