Super stealth dicing of transparent solids with nanometric precision

Abstract

Laser cutting of semiconductor wafers and transparent dielectrics has become a dominant process in manufacturing industries, encompassing a wide range of applications from flat display panels to microelectronic chips. Limited by Heisenberg's uncertainty principle imposed on the beam width and divergence angle of laser focus, a trade-off must be made between cutting accuracy and aspect ratio in conventional laser processing, which are typically at a micrometer and a hundred level. Herein, we propose a method to circumvent this limitation. It is based on the laser modification induced by a back-scattering interference crawling mechanism, which creates a positive feedback loop for elongating and homogenizing longitudinal energy deposition during laser-matter interaction. Consequently, cutting width on the scale of tens of nanometers and aspect ratio $\sim 10^4$ were simultaneously achieved. We refer to this technique as ``super stealth dicing'', which is based on an analytical model and validated through numerical simulations, ensuring its broad applicability. It can be applied to various transparent functional solids, such as glass, laser crystal, ferroelectric, and semiconductor, and is elevating the precision of future advanced laser dicing, patterning, and drilling into the nanometric era.Comment: 29 pages, 5 figure