In-Diffusion and Annealing Processes of Substitutional Nickel Atoms in Dislocation-Free Silicon

Authors
Publication date
Publisher
応用物理学会

Abstract

Abstract is not available.

    Similar works

    Full text

    thumbnail-image

    Available Versions

    Institutional Repositories DataBase (IRDB)

    redirect
    oaioai:irdb.nii.ac.jp:00851:00050...
    Last time updated on 04/01/2022