Large electric gradients are required for a variety of new applications, notably including the extreme high brightness electron sources for X-ray free electron lasers (FELs), RF photoinjector, industrial and medical accelerators and linear accelerators for particle physics colliders. In the framework of a INFN-LNF, SLAC (USA), KEK (Japan), UCLA (Los Angeles) collaboration, the Laboratori Nazionali di Frascati (LNF) is involved in the modelling, development and test of RF structures devoted to acceleration with high gradient electric field of particles through metal device. In order to improve the maximum sustainable gradients in normal conducting RF accelerating structures, we had to minimize the breakdown and the dark current. To this purpose the study of new materials and manufacturing techniques is mandatory to identify solutions to such extremely demanding applications. We considered the possibility to coat copper (and other metals) with a relatively thick film to improve and optimize breakdown performances. We present here the first characterization of MoO3 films deposited on copper by pulsed-laser deposition (PLD) starting from a commercial MoO3 target
