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Impact of atomic layer deposition temperature on HfO2/InGaAs metal-oxide-semiconductor interface properties
Authors
Noboru Fukuhara
Noboru Fukuhara
+22 more
Masahiko Hata
Masahiko Hata
Takuya Hoshii
Osamu Ichikawa
Osamu Ichikawa
Sang-Hyeon Kim
Sang-Hyeon Kim
Tatsuro Maeda
Tatsuro Maeda
Rena Suzuki
Rena Suzuki
Shinichi Takagi
Shinichi Takagi
Mitsuru Takenaka
Mitsuru Takenaka
Noriyuki Taoka
Noriyuki Taoka
Tetsuji Yasuda
Tetsuji Yasuda
Masafumi Yokoyama
Masafumi Yokoyama
拓也 星井
Publication date
7 January 2016
Publisher
'AIP Publishing'
Doi
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Abstract
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Last time updated on 06/09/2020