In order to achieve low processing temperature and efficient coatings deposition for manufacturing applications, a novel torch has been developed that couples in a double DBD design high frequency (HF ~17 kHz) and radio frequency (RF ~27 MHz) excitations. The design allows to obtain a stable RF plasma also in reactive processes and with the possibility to control on the treated substrates ions flux and surface charging, avoiding the micro-discharges. The plasma has been electrically and optically characterized by emission spectroscopy
