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Bio-orthogonal fluorinated resist for biomolecules patterning applications
Authors
F. Machairioti Petrou, P. Oh, H.-T. Lee, J.-K. Kakabakos, S. Argitis, P. Chatzichristidi, M.
Publication date
1 January 2019
Publisher
Abstract
The patterning of organic materials on solid substrate surfaces has been demonstrated by several methods, such as photolithography, soft lithography, imprint lithography and ink-jet printing. Fluorinated polymers and solvents provide attractive material systems to develop new patterning approaches, as they are chemically orthogonal to non-fluorinated organic molecules, allowing their efficient incorporation in different devices and systems. Moreover, fluorinated polymers are soluble in hydrofluoroether solvents, benign to biomolecules, and can be properly engineered to enable efficient photolithographic patterning. In this work, we report the development of a new photolithographic process for patterning biomolecules on any kind of surfaces either by physical adsorption or covalent bonding. The photoresist is based on a fluorinated material and hydrofluoroether solvents that have minimum interactions with biomolecules and thus they can be characterized as orthogonal to the biomolecules (bio-orthogonal). In both cases, the creation of patterns with dimensions down to 2 μm was achieved. The implementation of the developed photolithographic procedure for the creation of a multi-protein microarray is demonstrated. © 2019 Elsevier B.V
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Last time updated on 10/02/2023