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光纤掺氟的实验研究
Authors
邹林森
雷道玉
Publication date
1 January 1989
Publisher
《光通信研究》编辑部
Doi
Cite
Abstract
氟已成为MCVD法中重要的掺杂剂,其作用是制备各种凹陷内包层的单模光纤。本实验证明:由于CCl2F2掺入而使折射率降低△n-,是与CCl2F2流量(或等效分压)的1/5方幕成正比;二氧化硅的沉积效率与一个最佳的CCl2F2流量相对应,CCl2F2流量过高,形成SiF4会降低二氧化硅的沉积效率。故合理选择CCl2F2的流量,将有助于提高单模光纤预制棒的沉积速率和生产速度,降低光纤成本
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Last time updated on 26/01/2023