Resolution Enhancement of Thermal and Optical Nanolithography Using an Organic Dry Developing Resist and an Optimized Tip

Abstract

Ultrahigh nanolithography resolution of 31 nm was achieved using thin film layers of naphthoquinones compounds. Dry nanolithography processes, negative and positive were developed, utilizing the thermal and optical properties of these compounds, by using an Atomic Force Microscope with a tapered optical tip. Negative nanolithography was achieved using a specially designed optical fiber tip transmitting 488 nm of light that functions as a near field optical source. Positive nanolithography was achieved by coating the fiber tip with a metal film to serve as a nano-heating source. Sub-wavelength gratings with a variable line width, fabricated using these processes, are demonstrated