In the current work, nanocrystalline Fe0.5Ni0.5 magnetic thin films were deposited on a Si(100) substrate using the oblique-angle sputtering technique with the oblique deposition angle ranging from 11.5 to 45°. Structure, static magnetic properties, and dynamic magnetic characteristics were evaluated as a function of the deposition angle. The results indicate that the nanocrystalline FCC phase of FeNi with (111) preferred orientation and the average crystallite size of 6.3-9.3 nm was deposited successfully. The measured value of the uniaxial anisotropy field shows an increment from 7.65 to 16.71 Oe as the oblique angle rises from 11.5 to 45°, which in turn leads to an increase in the ferromagnetic resonance frequency from 0.63 to 0.88 GHz
