Plasma Source Ion Implantation (PSII) is a room temperature, plasma-based surface enhancement technology which is being commercialized through the efforts of a group of companies. A number of issues are critical to the successful design and operation of a commercial PSII system. These include overall vacuum system design, plasma source requirements and plasma-target interaction considerations, pulsed, high voltage sub-system (typically referred to as modulator) requirements, and target requirements and limitations. Critical system components are outlined and overall system design will be briefly covered
