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Influence of Li intercalation on thin films of V2O5 deposited by atomic layer deposition (ALD) : XPS, UPS and electrochemical studies
Authors
Andreas THISSEN
Franco DECKER
+4 more
Frédérique DONSANTI
Neluta IBRIS
Anna Maria SALVI
Wolfram JAEGERMANN
Publication date
1 January 2005
Publisher
Abstract
Abstract 4-A-0
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Archivio della Ricerca - Università della Basilicata
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oai:iris.unibas.it:11563/21644
Last time updated on 12/11/2016