Contains reports on one research project.Joint Services Electronics Program (Contract DAAB07-71-C-0300

Dylla, H. Frederick

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GENERAL PHYSICSI. MOLECULAR BEAMSAcademic and Research StaffProf. J. R. Zacharias Dr. S. A. Cohen J. H. AbramsProf. J. G. King Dr. E. H. Jacobsen F. J. O'BrienDr. J. W. Coleman Dr. M. G. R. Thomson C. H. TabbDr. J. C. WeaverGraduate StudentsJ. E. Bergmann S. R. Jost N. D. PunskyH. F. Dylla D. G. Lysy B. R. SilverJ. A. Jarrell D. TrauberA. COMPARISON OF TECHNIQUES FOR SURFACE MEASUREMENTSJoint Services Electronics Program (Contract DAAB07-71-C-0300)H. F. DyllaDuring this early stage in the development of the molecule microscope, we have foundit useful to survey and compare various techniques and the microscopy that can beapplied to surface measurements. To simplify categorizing the various techniques, sur-face measurements have been expressed schematically as shown in Fig. I-1. The clas-sification has been made along the following lines: Some form of energy (or particle)(1) is incident on the surface, and one or more forms of energy (or particles) are(1) INCIDENT ENERGY (2) DETECTED ENERGY(SCATTERED FROM SURFACE)SURFACE(3) DETECTED ENERGY(SCATTERED THROUGH SURFACE)Fig. I-1. Diagram of surface measurements.detected either (2) from scattering by the surface or (3) by scattering through the sur-face.In Table I-1 various surface measurement techniques are compared on the basis ofincident energy versus detected energy. Each technique is listed in abbreviated form(standard abbreviations are used for the more developed techniques) and pertinent ref-erences are given. Standard reference works are listed for the better established tech-niques such as electron microscopy. Whenever it is possible we refer to a recent,QPR No. 110Table I-1. Techniques for surface measurements.DETECTED PARTICLE (OR FORM OF DETECTED ENERGY)NEUTRALELECTRON PHOTON MOLECULE ION PHONON E/H FIELDCTEM EM(MA) ESD ESDSEM-STEM CIS SDMM SDMMLEED APSHEED CLAES-AEMISPES-PEM LM PD PDAES-AEM COL LMP LMPXES-XEM ELL SDMMHOLIRSNMR,ESRMOSSXRDSE NIR MBSS AHADSa,c(P)MMSE IIR ISD ISDINS IMXA SDMM SDMMIM(MA)ISSTE ES i FD SI ASWTL SDMMFES-FEM EL FIS-FIM CPDSCMSKEYConventional transmission electron microscopy MOSSScanning electron microscopy 2  XRDScanning transmission electron microscopy 3  NIRLow-energy electron diffraction4  IIRHigh-energy electron diffraction 1  IMXAAuger electron spectroscopy 5  ESAuger electron microscopy6  TLIonization spectroscopy 7  ELPhotoelectron spectroscopy 8  ESDPhotoelectron microscopy 9  SDMMExoelectron spectroscopy PDExoelectron microscopy 1 1  LMPSecondary emission MBSSIon neutralization spectroscopy 12  aThermionic emission a (p)Field-emission spectroscopyl3 MMField-emission microscopy 3  ISDElectron microprobe (mass analysis) 14  FD(X-ray) Characteristic isochromat spectroscopy IM (MA)(X-ray) Appearance potential spectroscopyl5 ISSCathodoluminescence SILight microscopy FISColorimetry: IR, VIS, UV, x-ray, y-ray FIM16absorption spectroscopy AHADSEllipsometry ASWHolography CPDInternal reflectance spectroscopyNuclear magnetic resonance 19 SCElectron-spin resonance 2 0 MSM6ssbauer spectroscopy 21(Glancing incidence) X-ray diffractionNeutral impact radiation2 2Ionic impact radiation2 2Ion microprobe x-ray analysisEmission spectroscopyThermoluminescenceElectroluminescence(Low energy) Electron-stimulated desorption2 324,25Scanning desorption molecule microscopyPhotodesorption2 6Laser microprobeMolecular-beam surface scatteringAccommodation coefficient measurementsAdsorption isotherm measurementsMolecule microscopy 24Ion-stimulated desorption2 8,2 9(Thermal or) Flash desorptionIon microprobe (mass analysis) 3 0Ion surface scattering2 9,3 1Surface ionizationField ion spectroscopy 3 2Field ion microscopy 32Heat of adsorption measurementsAcoustic surface-wave measurements3 3Work-function measurements by contact poten-tial differenceSurface capacitanceMagnetic saturation34QPR No. 110CTEMSEMSTEMLEEDHEEDAESAEMISPESPEMXESXEMSEINSTEFESFEMEM (MA)CISAPSCLLMCOLELLHOLIRSNMRESR(I. MOLECULAR BEAMS)relatively accessible review article concerned with the usefulness of a particular tech-nique for surface measurements (for example, LEED, AES, ellipsometry). As for themore recent techniques, we refer either to articles reporting initial results in the con-struction of prototype instruments (as in photoelectron microscopy or molecule micros-copy) or to design studies or project proposals for instruments or techniques that areunder investigation (as in scanning desorption molecule microscopy). Unreferencedentries in Table I-1 are those for which we were unable to find a general reference to anapplication of a technique to surface measurements, although the potential for such anapplication of the technique exists.References1. R. D. Heidenreich, Fundamentals of Transmission Electron Microscopy (Wiley-Interscience, New York, 1964); C. E. Hall, Introduction to Electron Microscopy(McGraw-Hill Book Company, Inc., New York, 1966).2. P. R. Thornton, Scanning Electron Microscopy (Chapman and Hall, Ltd., London,1968); C. W. Oatley, The Scanning Electron Microscope. Part 1. The Instrument(Cambridge University Press, London, 1972); J. W. S. Hearle, J. T. Sparrow, andP. M. Cross, The Use of the Scanning Electron Microscope (Pergamon Press,New York, 1972).3. A. V. Crewe, "The Current State of High Resolution Scanning Electron Microscopy,"Quart. Rev. Biophys. 3, 137 (1970).4. G. A. Somorjai and H. H. Farrell, Advan. Chem. Phys. 20, 215 (1970); J. J. Lander,Progress in Solid State Chemistry, Vol. 2 (The Macmillan Company, New York,1965); P. J. Estrup and E. G. McRae, Surface Sci. 25, 1 (1971); E. N. Sickafusand H. P. Bonzel, in J. F. Danielli et al. (Eds.), Progress in Surface and Mem-brane Science, Vol. 4 (Academic Press, Inc. , New York, 1971), p. 116.5. C. C. Chang, Surface Sci. 25, 53 (1971); P. W. Palmberg, in D. A. Shirley (Ed.),Electron Spectroscopy (North-Holland Publishing Company, Amsterdam, TheNetherlands, 1972), p. 835; K. Siegbhan et al., ESCA - Atomic, Molecular andSolid State Structure Studied by Means of Electron Spectroscopy (Almquist andWiksells, Uppsala, Sweden, 1971); E. N. Sickafus and H. P. Bonzel, op. cit. (ref. 4).6. N. C. MacDonald and J. R. Waldrop, Appl. Phys. Letters 19, 315 (1971); N. C.MacDonald, J. Vac. Sci. Technol. 10, 275 (1973); M. G. R. Thomson, QuarterlyProgress Report No. 108, Research Laboratory of Electronics, M.I.T., January 15,1973, p. 17.7. R. L. Park and J. E. Houston, J. Vac. Sci. Technol. 10, 176 (1973).8. "Photoelectron Spectroscopy of Metals," in R. F. Bunshak (Ed.), Metals, Vol. 6,(John Wiley and Sons, Inc. , New York, 1972), see Part 1.9. 0. H. Griffith et al. , Proc. Natl. Acad. Sci. U. S. 69, 561 (1972).10. K. Becker, Critical Reviews in Solid State Sciences, Vol. 3 (Chemical Rubber Co.,Cleveland, Ohio, 1972).11. P. Braunlich et al. , Appl. Phys. Letters 22, 61 (1973).12. H. D. Hagstrom, Science 177, 275 (1972); Phys. Rev. 150, 495 (1966).13. R. Gomer, Field Emission and Field Ionization (Harvard University Press, Cam-bridge, Mass., 1961); J. W. Gadzuk and E. W. Plummer, Rev. Mod. Phys. (to bepublished).QPR No. 110(I. MOLECULAR BEAMS)14. R. Castaing, "Electron Probe Microanalysis," in L. Marton (Ed.), Advances in Elec-tronics and Electron Physics, Vol. 12 (Academic Press, Inc. , New York, 1960),p. 215; K. F. J. Heinrich (Ed.), Quantitative Electron Probe Microanalysis (NationalBureau of Standards, Special Publication No. 298, 1968).15. J. C. Tracy, J. Appl. Phys. 43, 4164 (1972).16. R. P. Eischens and J. Jacknow, in Third International Congress on Catalysis (North-Holland Publishing Company, Amsterdam, The Netherlands, 1964).17. R. R. Stromberg and F. L. McCrasking, "Ellipsometry as a Tool for the Char-acterization of Surfaces," in G. Goldfinger (Ed.), Clean Surfaces: Their Preparationand Characterization for Interfacial Studies (Marcel Dekker, Inc., New York, 1970),p. 65.18. C. H. Amberg, in The Solid-Gas Interface (Marcel Dekker, Inc., New York, 1966);N. J. Harrick, Internal Reflection Spectroscopy (Wiley-Interscience, New York,1967).19. K. J. Parker, Progr. Nucl. Magnetic Resonance Spectrometry 2, 87-128 (1968).20. K. M. Soucier, J. Catalysis 5, 314 (1966); D. J. Miller and D. Haneman, SurfaceSci. 19, 45 (1969).21. M. C. Hobson, Jr., "The Mossbauer Effect in Surface Science," in J. F. Danielliet al. (Eds.), Progress in Surface and Membrane Science, Vol. 5 (Academic Press,Inc., New York, 1972), pp. 1-61.22. C. W. White, D. L. Simms, and N. H. Tolk, "Surface Composition Determined byAnalysis of Impact Radiation," Science 177, 481 (1972).23. T. E. Madey and J. T. Yates, Jr., J. Vac. Sci. Technol. 8, 525 (1971).24. J. C. Weaver and J. G. King, Proc. Natl. Acad. Sci. U.S. (submitted for publication).25. H. F. Dylla and G. A. Herzlinger, Quarterly Progress Report No. 108, ResearchLaboratory of Electronics, M. I. T., January 15, 1973, pp. 2-5.26. P. Kronauer and D. Menzel, in F. Ricca (Ed.), Adsorption-Desorption Phenomena(Academic Press, Inc. , New York, 1972), p. 313.27. J. N. Smith and H. Saltsburg, in H. Saltsburg et al. (Eds.), Fundamentals of Gas-Surface Interactions (Academic Press, Inc. , New York, 1967), pp. 370-391.28. C. F. Robinson, H. Liebl, and C. A. Anderson, Third National Electron MicroprobeConference, Chicago, 1968.29. G. Carter, J. Vac. Sci. Technol. 10, 95 (1973).30. C. A. Anderson and J. R. Hinthorne, Science 177, 853 (1972).31. D. J. Ball et al. , Surface Sci. 30, 69 (1972).32. E. W. Muller, Advances in Electronics and Electron Physics, Vol. 13, p. 18, 1960.33. G. Armand, P. Masri, and L. Dobrzysnski, "Surface Phonons and Gas SurfaceInteractions," J. Vac. Sci. Technol. 9, 705 (1971).34. G. A. Martin, G. Dalmai-Imelik, and B. Imelik, in F. Ricca (Ed.), Adsorption-Desorption Phenomena (Academic Press, Inc., New York, 1972), p. 433.QPR No. 110

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