Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008.Includes bibliographical references (p. 39-43).A novel processing method was developed for sub-50 nm structures by integrating quantum dots (QDs) on patterned polymer substrates. Poly(styrene-alt-maleic anhydride) (PSMa) was prepared by the initiated chemical vapor deposition (iCVD) method, an alternative to spin-on deposition. The sub-50 nm PSMa polymer patterns were prepared by low energy oxygen plasma etching by using CNTs as the masks. The water soluble, amine-functionalized QDs underwent the nucleophilic acyl substitution reaction with the PSMa containing anhydride functional groups. This integration method is use to incorporate high performance QDs on inexpensive, lightweight flexible substrate.by Chia-Hua Lee.S.M
