Tunneling atomic force microscopy for the nanoscale electrical and physical characterization of thin gate oxide films in different surrounding ambient

Authors
Publication date
19 June 2011
Publisher
HAL CCSD

Abstract

International audienc

    Similar works

    Full text

    thumbnail-image

    Available Versions

    Hal-Diderot

    redirect
    oaioai:HAL:hal-01811957v1
    Last time updated on 14/04/2021