CORE
🇺🇦
make metadata, not war
Services
Services overview
Explore all CORE services
Access to raw data
API
Dataset
FastSync
Content discovery
Recommender
Discovery
OAI identifiers
OAI Resolver
Managing content
Dashboard
Bespoke contracts
Consultancy services
Support us
Support us
Membership
Sponsorship
Community governance
Advisory Board
Board of supporters
Research network
About
About us
Our mission
Team
Blog
FAQs
Contact us
On the relationship between SiF4plasma species and sample properties in ultra low-k etching processes
Authors
Ramona Ecke
Micha Haase
+5 more
Norbert Lang
Marcel Melzer
Stefan E. Schulz
Jean-Pierre H. van Helden
Sven Zimmermann
Publication date
1 January 2020
Publisher
New York, NY : American Inst. of Physics
Doi
Cite
Abstract
The temporal behavior of the molecular etching product SiF4 in fluorocarbon-based plasmas used for the dry etching of ultra low-k (ULK) materials has been brought into connection with the polymer deposition on the surface during plasma treatment within the scope of this work. For this purpose, time-resolved measurements of the density of SiF4 have been performed by quantum cascade laser absorption spectroscopy. A quantification of the non-linear time dependence was achieved by its characterization via a time constant of the decreasing SiF4 density over the process time. The time constant predicts how fast the stationary SiF4 density is reached. The higher the time constant is, the thicker the polymer film on top of the treated ultra low-k surface. A correlation between the time constant and the ULK damage was also found. ULK damage and polymer deposition were proven by Variable Angle Spectroscopic Ellipsometry and X-ray Photoelectron Spectroscopy. In summary, the observed decay of the etching product concentration over process time is caused by the suppressed desorption of the SiF4 molecules due to a more dominant adsorption of polymers. © 2020 Author(s)
Similar works
Full text
Open in the Core reader
Download PDF
Available Versions
Sustaining member
Repositorium für Naturwissenschaften und Technik
See this paper in CORE
Go to the repository landing page
Download from data provider
oai:oa.tib.eu:123456789/6649
Last time updated on 23/07/2022