Optical response of TiO2 layers, prepared by R.F. sputtering from TiO2 target, was studied as a function of target state, oxygen partial pressure and sputtering power. We have found that TiO2 layers deposited from a used target exhibit a high absorptance which decreases greatly when an oxygen partial pressure is introduced. Whereas an increase of sputtering power leads to an absorbent TiO2 matrix.Optical response of TiO2 layers, prepared by R.F. sputtering from TiO2 target, was studied as a function of target state, oxygen partial pressure and sputtering power. We have found that TiO2 layers deposited from a used target exhibit a high absorptance which decreases greatly when an oxygen partial pressure is introduced. Whereas an increase of sputtering power leads to an absorbent TiO2 matrix
