Plasma nitriding treatments are applied to achieve excellent surface properties on steel parts and tools. Active screen plasma nitriding (ASPN) does not have the defects presents in direct nitriding plasma treatments (DCPN). However, ASPN require much longer processing times to develop surface layers as deep as those of DCPN. This work presents the development of a biased ASPN treatment system, to investigate the possibility of achieving greater efficiency. The treatments were performed on ASTM M2 steel samples using the same processing parameters in 4 different configurations: DCPN, ASPN and 2 active screen plasma nitriding with biased specimens voltage: one was called "bright bias", because biased voltage is high enough to develop a plasma glow on the samples, and the other "dark bias", where no plasma glow sheath is seen on the samples. The active screen dark biased treatment presented the best results. These results could be understood by the electromagnetic field generated by the bias source promoting the deposition of nitrogen ions on the surface of the part being treated. Therefore, it was demonstrated that the use of dark bias voltage in the active screen treatment in larger reactors is fundamental to achieve good nitriding results in smaller times
