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Equivalent oxide thickness reduction of interpoly dielectric using ALD-Al[sub 2]O[sub 3] for flash device application
Authors
Barbara Haselden
Chuck Jang
+8Â more
Hood Chatham
Lawrence Bartholomew
Lee
Lee
Mark Dong
Seung Park
Tai-Peng Lee
Yoshihide Senzaki
Publication date
1 January 2004
Publisher
'American Vacuum Society'
Doi
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Last time updated on 06/01/2021