Abstract-A high contrast electroluminescent (EL) device structure is presented. The diffuse luminous reflectivity from the metal/dielectric/phosphor/indium-tin-oxide/glass EL device structure is 3%. A Eu-doped GaN phosphor is used to demonstrate the contrast-enhanced operation. Low reflectivity is achieved by inserting a light-absorbing black thick-film BaTiO 3 layer between the phosphor and the rear metal electrode. In addition to providing contrast enhancement, the opaque thick dielectric film exhibits capacitance and high voltage reliability (40 nF/cm 2 , dielectric constant 500-1000, breakdown field 0 1-0 4 MV/cm) similar to that of the highest performance transparent thin-film dielectrics. An EL device luminance of only 20 cd/m 2 is sufficient for a display contrast ratio of 10:1 under 140 lux indoor ambient lighting (illumination). Under sunlight illumination of 100 000 lux, a display contrast ratio of 3:1 is expected with application of additional contrast enhancement techniques