Chemically Resolved Interface Structure of Epitaxial Graphene on SiC(0001)

Abstract

Atomic-layer 2D crystals have unique properties that can be significantly modified through interaction with an underlying support. For epitaxial graphene on SiC(0001), the interface strongly influences the electronic properties of the overlaying graphene. We demonstrate a novel combination of x-ray scattering and spectroscopy for studying the complexities of such a buried interface structure. This approach employs x-ray standing wave-excited photoelectron spectroscopy in conjunction with x-ray reflectivity to produce a highly resolved chemically sensitive atomic profile for the terminal substrate bilayers, interface, and graphene layers along the SiC[0001] direction. DOI: 10.1103/PhysRevLett.111.215501 PACS numbers: 61.48.Gh, 61.05.cm, 68.49.Uv, 79.60.Ài Epitaxial graphene (EG) grown on the Si-terminated face of silicon carbide [SiC Early studies revealed that EG/SiC(0001) possesses a complex 6 p 3 Â 6 p 3R30 (6R3) reconstructed interfacial layer [10], referred to herein as the interfacial, or EG 0 , layer. This layer has significant influence on the growth, morphology, and electronic behavior of the overlaying graphene Because of the importance of the interfacial layer to the behavior of EG/SiC(0001), there have been numerous efforts to characterize its structure, including low-energy electron diffraction In this Letter we detail the structure of the interface by employing a suite of x-ray characterization techniques, including depth-sensitive XPS, x-ray standing waveenhanced XPS (XSW-XPS), and x-ray reflectivity (XRR). These tools, when employed collectively, provide the chemically specific structural information necessary to clarify previously unknown details of the EG/SiC(0001) interface. This approach ultimately enables the construction of a chemically resolved interfacial map with sub-Å resolution along the SiC[0001] direction. The XSW technique affords conventional photoelectron spectroscopy with high spatial resolution due to the influence of the XSW [here produced by the SiC(0006) Bragg reflection] on the photoabsorption process. A depiction of this phenomenon is shown i

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