DRAFT IMECE2003-41216 CRYSTALLIZATION OF SPUTTERED NiTi FILMS

Abstract

ABSTRACT Sputtered, crystalline thin films of nickel-titanium (NiTi) can display both superelastic properties and the shape memory effect, either of which may be used in films for MEMS sensors and actuators. However, direct deposition of crystalline NiTi films requires high deposition temperature and cooldown can lead to catastrophic delamination from extrinsic residual stress. To avoid delamination, especially for thick films (>5 micrometers) the amorphous form of NiTi can be sputter deposited at a low temperature, patterned and etched, released, and then crystallized to develop the proper microstructure