Physical Properties of UDF12 Galaxies in Cosmological simulations

We have performed a large cosmological hydrodynamics simulation tailored to the deep survey with the Hubble Space Telescope made in 2012, the so-called UDF12 campaign. After making a light-cone output, we have applied the same color selection criteria as the UDF12 campaign to select galaxies from our simulation, and then, have examined the physical properties of them as a proxy of the real observed UDF12 galaxies at $z > 7$. As a result, we find that the halo mass is almost linearly proportional to the observed ultraviolet (UV) luminosity ($4 \times 10^{11}~{\rm M_{\odot}}$ at $M_{\rm UV} = -21$). The dust attenuation and UV slope $\beta$ well correlates with the observed UV luminosity, which is consistent with observations quantitatively. The star formation rate (SFR) is also linearly proportional to the stellar mass and the specific SFR shows only a weak dependency on the mass. We also find an increasing star formation history with a time-scale of $\sim100$ Myr in the high-$z$ galaxies. An average metallicity weighted by the Lyman continuum luminosity reaches up to $>0.1$ Solar even at $z \sim 10$, suggesting a rapid metal enrichment. We also expect $\geq 0.1$ mJy at 350 GHz of the dust thermal emission from the galaxies with $H_{160} \leq 27$, which can be detectable with the Atacama Large Milimetre-submilimetre Array. The galaxies selected by the UDF12 survey contribute to only $52--12\%$ of the cosmic SFR density from $z \sim 7$ to $z \sim 10$, respectively. The James Webb Space Telescope will push the detection fraction up to $77--72\%$.Comment: re-Submitted to MNRAS; 16 pages; 14 figures; 1 tables

Electron Beam Lithography for Large Area Patterning 4: Exposure of Resist on Internal Surface of a Through-Hole

Electron beam direct writing technologies, specifically for the large area patterning of electronic devices such as printed wiring boards, are studied in this paper. The exposure characteristics of the resist on the internal surface of a through-hole are examined. A thick film resist which is composed mainly of unsaturated acrylic resins is prepared on the internal surface of the hole by an electrodeposition process. It is proven that a 20 μm thick resist on the internal surface can be exposed efficiently by a 60 keV electron beam. This phenomenon becomes even stronger by placing a gold plated metal plate on the back of the substrate. The comparison between the experiments and the Monte Carlo calculations for electron trajectory leads to a conclusion that the exposure characteristics of the resist on the internal surface of the through-hole can be explained mainly by the behavior of backscattered electron in the hole

Mitotic Exit Network Controls the Localization of Cdc14 to the Spindle Pole Body in Saccharomyces cerevisiae

AbstractBudding yeast Cdc14 phosphatase plays essential roles in mitotic exit. Cdc14 is sequestered in the nucleolus by its inhibitor Net1/Cfi1 and is only released from the nucleolus during anaphase to inactivate mitotic CDK. It is believed that the mitotic exit network (MEN) is required for the release of Cdc14 from the nucleolus because liberation of Cdc14 by net1/cfi1 mutations bypasses the essential role of the MEN. But how the MEN residing at the spindle pole body (SPB) controls the association of Cdc14 with Net1/Cfi1 in the nucleolus is not yet understood [1, 2]. We found that Cdc14-5GFP was released from the nucleolus in the MEN mutants (tem1, cdc15, dbf2, and nud1), but not in the cdc5 cells during early anaphase. The Cdc14 liberation from the nucleolus was inhibited by the Mad2 checkpoint and by the Bub2 checkpoint in a different manner when microtubule organization was disrupted. We observed Cdc14-5GFP at the SPB in addition to the nucleolus. The SPB localization of Cdc14 was significantly affected by the MEN mutations and the bub2 mutation. We conclude that Cdc14 is released from the nucleolus at the onset of anaphase in a CDC5-dependent manner and that MEN factors possibly regulate Cdc14 release from the SPB