X-Ray Single-Grating Interferometry for Wavefront Measurement and Correction of Hard X-Ray Nanofocusing Mirrors

X-ray single-grating interferometry was applied to conduct accurate wavefront corrections for hard X-ray nanofocusing mirrors. Systematic errors in the interferometer, originating from a grating, a detector, and alignment errors of the components, were carefully examined. Based on the measured wavefront errors, the mirror shapes were directly corrected using a differential deposition technique. The corrected X-ray focusing mirrors with a numerical aperture of 0.01 attained two-dimensionally diffraction-limited performance. The results of the correction indicate that the uncertainty of the wavefront measurement was less than λ/72 in root-mean-square value.Yamada, J.; Inoue, T.; Nakamura, N.; Kameshima, T.; Yamauchi, K.; Matsuyama, S.; Yabashi, M. X-Ray Single-Grating Interferometry for Wavefront Measurement and Correction of Hard X-Ray Nanofocusing Mirrors. Sensors 2020, 20, 7356. https://doi.org/10.3390/s20247356

Development of concave-convex imaging mirror system for a compact and achromatic full-field x-ray microscope

Jumpei Yamada, Satoshi Matsuyama, Shuhei Yasuda, Yasuhisa Sano, Yoshiki Kohmura, Makina Yabashi, Tetsuya Ishikawa, and Kazuto Yamauchi "Development of concave-convex imaging mirror system for a compact and achromatic full-field x-ray microscope", Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 103860C (6 September 2017); https://doi.org/10.1117/12.2272904

Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications

We have developed a method of fabricating speckle-free channel-cut crystal optics with plasma chemical vaporization machining, an etching method using atmospheric-pressure plasma, for coherent X-ray applications. We investigated the etching characteristics to silicon crystals and achieved a small surface roughness of less than 1 nm rms at a removal depth of >10 μm, which satisfies the requirements for eliminating subsurface damage while suppressing diffuse scattering from rough surfaces. We applied this method for fabricating channel-cut Si(220) crystals for a hard X-ray split-and-delay optical system and confirmed that the crystals provided speckle-free reflection profiles under coherent X-ray illumination.Takashi Hirano, Taito Osaka, Yasuhisa Sano, Yuichi Inubushi, Satoshi Matsuyama, Kensuke Tono, Tetsuya Ishikawa, Makina Yabashi, and Kazuto Yamauchi, "Development of speckle-free channel-cut crystal optics using plasma chemical vaporization machining for coherent x-ray applications", Review of Scientific Instruments 87, 063118 (2016) https://doi.org/10.1063/1.4954731