19 research outputs found

    Development of a Transparent Thermal Reflective Thin Film Coating for Accurate Separation of Food-Grade Plastics in Recycling Process via AI-Based Thermal Image Processing

    Get PDF
    This paper presents the development of a specific thin film coating designed to address the challenge of accurately separating food-grade plastics in the recycling process. The coating, created using a plasma sputtering process, is transparent to the visible spectrum of light while effectively reflecting infrared emissions above 1500 nm. Composed of a safe metal oxide formulation with a proprietary composition, the coating is applied to packaging labels. By employing thermal imaging and a computer vision AI model, the coated labels enable precise differentiation of plastics associated with food packaging in the initial stage of plastic recycling. The proposed system achieved a remarkable 100% accuracy in separating food-grade plastics from other types of plastics. This innovative approach holds great potential for enhancing the efficiency and effectiveness of plastic recycling processes, ensuring the recovery of food-grade plastics for future use

    Highly conductive zinc oxide based transparent conductive oxide films prepared using RF plasma sputtering under reducing atmosphere

    Get PDF
    Š 2020 by the authors. The spectral properties and colour functions of a radio frequency (RF)-based sputtering plasma source was monitored during consecutive sputter deposition of zinc doped indium oxide (IZO) thin films under argon and argon/hydrogen mix. The effect of target exposure to the hydrogen gas on charge density/mobility and spectral transmittance of the deposited films was investigated. We demonstrate that consecutive exposure to the hydrogen gas during the deposition process progressively affects the properties of thin films with a certain degree of continuous improvement in electrical conductivity while demonstrating that reverting to only argon from argon/ hydrogen mix follows a complex pathway, which has not been reported previously in such detail to our knowledge. We then demonstrate that this effect can be used to prepare highly conductive zinc oxide thin films without indium presence and as such eliminating the need for the expensive indium addition. We shall demonstrate that complexity observed in emission spectra can be simply identified by monitoring the colour of the plasma through its colour functions, making this technique a simple real-time monitoring method for the deposition process.Grand Challenge Research Fund (GCRF) SUNRISE program, No. EP/P032591/1

    Morbid risk of schizophrenia amongst relatives of schizophrenia probands: A family-controlled study

    Get PDF
    Introduction: There is a dearth of data on heritability of schizophrenia in Africa. The few African studies that addressed familial psychiatric morbidity in schizophrenia involved relatively small sample sizes and addressed psychiatric morbidity only in first-degree relatives. The present study sought to improve upon the methodology of previous African studies, and widen the scope to second- and third-degree relatives with a view to enriching the field of genetic epidemiology in Africa. Methods: This study elicited information on the morbid risk of schizophrenia amongst 5259 relatives of schizophrenia probands (n = 138) and 6734 relatives of healthy controls (n = 138) through direct interview of patients, available relatives of patients and controls. Diagnosis of probands was confirmed using Mini International Neuropsychiatric Interview. Through a direct interview of 138 patients and their available relatives, a family history approach using the Family Interview for Genetic Studies was utilised to obtain information on the morbid risk for all relatives that could be recalled. The same approach was utilised for the interview of the controls (aged 45 years and above) and their relatives. Morbid risk estimates were calculated using the Weinberg shorter method. Results: Morbid risk for schizophrenia in the first-, second- and third-degree relatives of schizophrenia probands was 10.9% (95% confidence interval [CI] = 10.6–11.2), 4.2% (95% CI = 4.1–4.3) and 3.9% (95% CI = 3.6–4.2), respectively, compared with 2.6% (95% CI = 2.5–2.7), 1.6% (95% CI = 1.5–1.7) and 1.5% (95% CI = 1.4–1.6), respectively, of the healthy control group. Conclusion: The findings support the widely noted impression that schizophrenia significantly aggregates in families of schizophrenia probands more than healthy controls
    corecore