16,908 research outputs found

    Long-Wavelength Excesses in Two Highly Obscured High-Mass X-Ray Binaries: IGR J16318–4848 and GX 301–2

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    We present evidence for excess long-wavelength emission from two high-mass X-ray binaries, IGR J16318-4848 and GX 301-2, that show enormous obscuration (N_H ≃ 10^(23)-10^(24) cm^(-2)) in their X-ray spectra. Using archival near- and mid-infrared data, we show that the spectral energy distributions of IGR J16318-4848 and GX 301-2 are substantially higher in the mid-infrared than their expected stellar emission. We successfully fit the excesses with ~1000 K blackbodies, which suggests that they are due to warm circumstellar dust that also gives rise to the X-ray absorption. However, we need further observations to constrain the detailed properties of the excesses. This discovery highlights the importance of mid-infrared observations for understanding highly obscured X-ray binaries

    Dislocation Velocity in Single and Polycrystalline Silicon Iron

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    The stress dependence of screw dislocation velocity single and polycrystalline specimens of an iron-3.14% silicon alloy was measured by observation of slip band growth. An electrolytic etching technique was used to reveal dislocation intersections with the specimen surface, and slip bands were observed to form from fresh scratches and from grain boundaries as a result of pulse loading. Screw dislocation velocity on the {110} 〈111〉system in single crystals at room temperature followed the relation ν = (τ/τ_0)^n where n = 30.1. A plot of screw dislocation velocity vs. nominal resolved shear stress in individual grains of polycrystalline specimens shows considerable scatter which is attributed to the effects of stress variations due to elastic anisotropy. Observation of slip band growth in scratched and unscratched grains indicates that the stress required to activate grain boundary sources is greater than the stress required to propagate fresh dislocations

    The initiation of yielding in silicon-iron

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    An experimental program was conducted in which the etch pit technique was used for the direct observation of dislocation configurations at various stages of yielding. Poly-crystalline tensile specimens of 3 per cent silicon-iron were loaded in tension at constant strain rate and by load pulses. A new model of the delay-time for yielding at constant applied stress is presented. Three assumptions used are (a) no dislocation motion occurs below a critical resolved shear stress, (b) the yielding rate is dependent upon the velocity of mobile dislocations, and (c) the end of the delay period occurs when yielding of the grains has spread continuously through the thickness of the specimen. This model is consistent with the experimental observations and explains the true static upper yield point and the shape of the strain vs. time curve at constant applied stress. The model also yields reasonable values for the stress concentration factor on grains in the critical cross-section that are least favorably oriented for slip

    Dislocation velocity in single and polycrystalline silicon-iron

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    The stress dependence of screw-dislocation velocity in single and polycrystalline specimens of an iron-3.14% silicon alloy was measured by observation of slip-band growth. An electrolytic etching technique was used to reveal dislocation intersections with the specimen surface, and slip bands were observed to form from fresh scratches and from grain boundaries as a result of pulse loading. Screw dislocation velocity on the {110} 111 system in single crystals at room temperature followed the relation ΰ = (τ/τ0)n, where n = 30.1. A plot of screw-dislocation velocity vs nominal resolved shear stress in individual grains of polycrystalline specimens shows considerable scatter which is attributed to the effects of stress variations due to elastic anisotropy. Observation of slip-band growth in scatched and unscratched grains indicates that the stress required to activate grain boundary sources is greater than the stress required to propagate fresh dislocations

    Quantum Hall Ferromagnets: Induced Topological term and electromagnetic interactions

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    The ν=1\nu = 1 quantum Hall ground state in materials like GaAs is well known to be ferromagnetic in nature. The exchange part of the Coulomb interaction provides the necessary attractive force to align the electron spins spontaneously. The gapless Goldstone modes are the angular deviations of the magnetisation vector from its fixed ground state orientation. Furthermore, the system is known to support electrically charged spin skyrmion configurations. It has been claimed in the literature that these skyrmions are fermionic owing to an induced topological Hopf term in the effective action governing the Goldstone modes. However, objections have been raised against the method by which this term has been obtained from the microscopics of the system. In this article, we use the technique of the derivative expansion to derive, in an unambiguous manner, the effective action of the angular degrees of freedom, including the Hopf term. Furthermore, we have coupled perturbative electromagnetic fields to the microscopic fermionic system in order to study their effect on the spin excitations. We have obtained an elegant expression for the electromagnetic coupling of the angular variables describing these spin excitations.Comment: 23 pages, Plain TeX, no figure
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