32 research outputs found

    Oxidation Behavior and Structural Transformation of (CrTaTiVZr)N Coatings

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    (CrTaTiVZr)N coatings were prepared on Si substrates through the reactive magnetron sputtering system to investigate the oxidation behaviors and structural evolution of the coatings at different annealing temperatures in air. The (CrTaTiVZr)N coating had a face-centered cubic structure with an oxidation temperature of up to 300 °C, but its surface changed into the amorphous oxide phase and then into the rutile TiO2 phase when the annealing temperature was increased to 500 °C. The rutile TiO2 phase continued to grow, and an additional solid solution phase of body-centered tetragonal I41/amd was formed at annealing temperatures beyond 600 °C. The high annealing temperature promoted the oxidation to progress along the thickness direction and synergistically developed the porosity. As a result, the hardness and the electrical performance of the coating deteriorated. The hardness decreased from 34.30 GPa to 1.52 GPa, and the electrical resistivity increased from 142 µΩ·cm to 17.5 Ω·cm

    Effect of Annealing on Calcium Carbonate Morphology of Mollusk Shell

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    [[abstract]]After the aragonite nacreous layer and cross section of Periglypta Magnifica mollusk shell were annealed, the influences, including crystallization temperatures, crystallization time and concentrations of calcium chloride aqueous solution on the crystal morphology of annealed shell was studied. These three factors evidently influenced the crystal morphology of calcium carbonate, whose annealed morphology was different from its origin. In addition, the cross section of annealed shell contained three crystallized regions of calcium carbonate.[[booktype]]電子

    AC Plus Deposition Method to Fabricate Array Ni Nanowires

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    Effects of substrate bias on structure and mechanical properties of (TiVCrZrHf)N coatings

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    (TiVCrZrHf)N coatings were deposited via reactive radio-frequency (RF) magnetron sputtering at different substrate biases (0 to 200 V). The chemical composition, microstructure, and mechanical properties of the coatings were investigated. As the substrate bias increased, the preferred orientation of the (TiVCrZrHf)N coatings changed from (111) to (200). Reduced grain size and surface roughness were also observed. The microstructure obviously changed, from a V-shaped columnar structure with clearly faceted surface features to a highly dense structure with a very smooth surface. Moreover, a continuous variation in the microstructure, from randomly oriented nanograins to columns with a face-centered cubic (FCC) phase, was evident. The hardness of the coatings deposited at 100 V or higher was around 32–33 GPa. The structural evolution and strengthening mechanism of the coatings were also discussed

    Structural morphology and characterization of (AlCrMoTaTi)N coating deposited via magnetron sputtering

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    (AlCrMoTaTi)N coatings were deposited on Si substrates via reactive magnetron sputtering. The effects of N2-to-total (N2 + Ar) flow ratio (RN) on the coating structure and properties were examined. Alloy coatings have composite equiaxed grain structures consisting of amorphous and body-centered cubic crystal phases, whereas nitride coatings have columnar structures with single face-centered cubic crystal phase. Distinct lattice expansion and grain refinement were observed in nitride coatings as RN increased. Typical V-shaped columnar structures with faceted tops and open column boundaries transformed into denser and smaller columnar structures with domed surfaces. Increasing RN to 30% caused the hardness and modulus to reach maximum values of 30.6 and 291.6 GPa, respectively. Electrical resistivity increased from 536 μΩ cm to 8212 μΩ cm when RN increased from 10% to 50%
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