100 research outputs found

    Time-Resolved Observation of Deposition Process of Ultrananocrystalline Diamond/Hydrogenated Amorphous Carbon Composite Films in Pulsed Laser Deposition

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    Optical emission spectroscopy was used to study pulsed laser ablation of graphite in a hydrogen atmosphere wherein ultrananocrystalline diamond (UNCD)/hydrogenated amorphous carbon (a-C:H) composite films were grown on heated substrates. Time-resolved photographs of a plume that expanded from a laser-irradiation spot toward a substrate were taken using a high-speed ICCD camera equipped with narrow-bandpass filters. While the emissions from C atoms and C2 dimers lasted above the laser-irradiation spot on the target, the emission from C+ ions lasted above the substrate surface for approximately 7 microseconds, although the emission lifetime of species is generally approximately 10 nanoseconds. This implies that C+ ions actively collided with each other above the substrate surface for such a long time. We believe that the keys to UNCD growth in PLD are the supply of highly energetic carbon species at a high density to the substrate and existence of atomic hydrogen during the growth

    Effects of Arranging Training Dikes on the Formation of Central Sandbars

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    Source: ICHE Conference Archive - https://mdi-de.baw.de/icheArchive

    Sustainable super-hard and thick nanodiamond composite film deposited on cemented carbide substrates with an interfacial Al-interlayer.

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    Super-hard nanodiamond composite (NDC) films, synthesized via cathodic arc plasma deposition on unheated WC−Co substrates, offer an eco-friendly solution for cutting tools. A 100 nm-thick Al-interlayer mitigates Co catalytic effects, improving adhesion and yielding smooth and dense 10 µm-thick films at a deposition rate of 3.3μm/hr. These grain-boundary-rich nanostructured films, with an impressive 58 GPa hardness attributed to a substantial 70% C sp3 fraction, prove optimal for hard coatings. The Al-interlayer effectively suppresses Co catalytic effects, forming a dense Al-oxide layer, enhancing film hardness and adhesion (Lcr=18.6N). NDC films present a promising eco-friendly option for high-performance hard coatings

    Influence of droplet-free ta-C coatings and lubrication conditions on tribological performance and mechanical characteristics of WC−Co.

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    Cemented carbide (WC−Co) tools suffer from surface abrasion, limiting their performance. This study explores droplet-free tetrahedral amorphous carbon (ta-C) coatings deposited via arc ion plating as a solution. The coatings possess a dense, sp3-rich structure, leading to a remarkable hardness of 60 GPa compared to 37 GPa of WC−Co, and strong adhesion with a critical scratch load of 41 N. Tribological tests confirm their effectiveness. Dry sliding tests show reduced wear and lower CoF (0.123) compared to uncoated tools (0.159). Notably, water-soluble lubricants yielded the best performance (lowest CoF: 0.092, superior wear resistance), while water and mineral oil also improved performance

    Surface morphology and wettability for thin films of beta-iron disilicide produced through direct-current sputtering utilizing a pair of facing targets

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    In the current work, beta-FeSi2 films were epitaxially produced onto Si(111) wafer substrates via usage of facing-targets direct-current sputtering (FTDCS). The temperature for substrate heating was maintained at 600 °C and the sputtering pressure was set at 1.33 × 10-1 Pa. The surface morphology and contact angles of the beta-FeSi2 films were explored consistently in this research. Images of three-dimensional AFM and FESEM for the beta-FeSi2 film surface revealed a smooth surface with a root mean square roughness of 1.31 nm and a porous area. The average contact angle between the dropped water and beta-FeSi2 film surface was found to be 98.7°, establishing that the surface of the beta-FeSi2 films was hydrophobic. The acquired experimental results revealed the commencement of the hydrophobic surface feature of the beta-FeSi2 films produced via FTDCS approach

    Wear-resistant and adherent nanodiamond composite thin film for durable and sustainable silicon carbide mechanical seals.

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    In response to environmental concerns, there is a growing demand for durable and sustainable mechanical seals, particularly in high-risk industries like chemical, petroleum, and nuclear sectors. This work proposes augmenting the durability and sustainability of silicon carbide (SiC) ceramic seals with the application of a nanodiamond composite (NDC) film through coaxial arc plasma deposition (CAPD) in a vacuum atmosphere. The NDC coating, with a smooth surface roughness of Ra = 60 nm as substrate, demonstrated a thickness of 1.1 μm at a deposition rate of 2.6 μm/hr. NDC film has demonstrated exceptional mechanical and tribological characteristics, such as a hardness of 48.5 GPa, Young’s modulus of 496.7 GPa, plasticity index (H/E) of 0.098, and fracture toughness of H3/E2 = 0.46 GPa, respectively. These NDC films showcased commendable adhesion strength (> 60 N), negligible wear, and low friction (≤ 0.18) during dry sliding against a SiC counter material. Raman analysis has confirmed the nanocomposite structure of NDC film, emphasizing the role of highly energetic carbon ions in enhancing film adhesion by forming SiC intermetallic compounds at the interface through the diffusion of silicon atoms from the substrate into the films. The abundance of grain boundaries and rehybridization of carbon sp3 to sp2 bonding is perceived to improve tribological performance. CAPD excels in synthesizing long-life eco-friendly NDC coatings for durable and sustainable mechanical seals, featuring smooth surfaces, superior adhesion, outstanding hardness, and wear resistance, making them high potential candidates for various tribological applications

    Disclosing mechanical and specific structural characteristics of thick and adherent nanodiamond composite hard coating deposited on WC−Co substrates.

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    Nanodiamond composite (NDC) films, with a notable hardness of 65 GPa and a substantial thickness of 10 µm, were successfully fabricated on unheated WC−Co substrates using cathodic arc plasma deposition (CAPD) technology. Raman and synchrotron-based structural analysis, comparing NDC films with similarly hard tetrahedral amorphous carbon (ta-C) films and chemical vapor deposition (CVD) diamond, unveiled distinctive features. Visible Raman spectroscopy highlighted NDC's unique nanostructured composition, characterized by nanodiamond grains embedded in an amorphous carbon matrix, resulting in a high fraction of C−C sp3 bonds (70%) and intense σ* C−C resonance contributing to its observed hardness. The small size of diamond crystals induced numerous grain boundaries, as evident through intense t-PA Raman peaks, effectively suppressing internal stress to 2.77 GPa and enabling the deposition of an impressive thickness (10 µm), surpassing the thinness of hard ta-C (< 1 µm). Despite the substantial thickness, NDC films demonstrated remarkable films-substrate adhesion, with no delamination and minimal spallation, in contrast to observed buckling and delamination in CVD diamond during Rockwell testing at various loads (60 Kg and 100 Kg). Additionally, NDC films maintained a stable and low coefficient of friction (≤ 0.1) against an Al2O3 counter-body, compared to the higher coefficient (≥ 0.25) of the bare WC-Co substrate. Furthermore, NDC deposition boasted a rapid rate (3.5 µm/hr), significantly exceeding both ta-C and diamond coatings, enhancing its practical applicability. Significantly, the deposition process for NDC films stands out for its environmental friendliness and cost-effectiveness, involving no external heating, chemical reactions, chemical etching of Co, or nanodiamond seeding. The findings underscore the exceptional potential of NDC as a strong competitor to hard ta-C and CVD diamond coatings, especially in advanced cutting tool applications

    Temperature-dependent magnetoresistance effects in FeSi/FeSi/FeSi trilayered spin valve junctions

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    Fe3Si/FeSi2/Fe3Si trilayered junctions were fabricated by facing targets direct-current sputtering combined with a mask method, and the spin valve signals of the junctions were studied in the temperature range from 50 to 300 K. Whereas the magnetoresistance ratio of giant magnetoresistance and tunnel magnetoresistance junctions monotonically increases with decreasing temperature, that of our samples has the maximum value around 80 K and decreases with decreasing temperature at lower than 80 K, which might be due to an increase in the electrical conductivity mismatch between the metallic Fe3Si layers and semiconducting FeSi2 interlayer in the low temperature range.Asia-Pacific Conference on Semiconducting Silicides and Related Materials — Science and Technology Towards Sustainable Electronics (APAC Silicide 2016), July 16-18, 2016, Fukuoka, Japa
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