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1 research outputs found
Self-aligned double patterning for active trim contacts with anisotropic pattern pitches in sub-20Â nm dynamic random access memories
Author
Chansic Yoon
Dongoh Kim
+7Â more
Hokyu Kang
Hyoungsub Kim
Kiseok Lee
Kyupil Lee
Sunghee Han
Taejin Park
Yoosang Hwang
Publication venue
'SPIE-Intl Soc Optical Eng'
Publication date
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