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    Controlling the Intrinsic Josephson Junction Number in a Bi2Sr2CaCu2O8+δ\mathbf{Bi_2Sr_2CaCu_2O_{8+\delta}} Mesa

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    In fabricating Bi2Sr2CaCu2O8+δ\mathrm{Bi_2Sr_2CaCu_2O_{8+\delta}} intrinsic Josephson junctions in 4-terminal mesa structures, we modify the conventional fabrication process by markedly reducing the etching rates of argon ion milling. As a result, the junction number in a stack can be controlled quite satisfactorily as long as we carefully adjust those factors such as the etching time and the thickness of the evaporated layers. The error in the junction number is within ±1\pm 1. By additional ion etching if necessary, we can controllably decrease the junction number to a rather small value, and even a single intrinsic Josephson junction can be produced.Comment: to bu published in Jpn. J. Appl. Phys., 43(7A) 200

    Bis(4-ammonio-4-methyl­pentan-2-one-κO)dioxalato-κ4 O 1,O 2-copper(II)

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    The title compound, [Cu(C2O4)2(C6H14NO)2], was synthesized by mixing diacetonamine hydrogen oxalate and copper sulfate in ethanol/water. The mol­ecule is centrosymmetric, so two pairs of equivalent ligands lie trans to each other. The CuII center, located on a position with 2/m site symmetry, is six-coordinated by four O atoms from two oxalate ligands at short distances and the carbonyl O atoms from the 4-amino-4-methyl­pentan-2-one ligands at longer distances. Mol­ecules are linked through inter­molecular N—H⋯O hydrogen bonds between the amino groups and carbonyl O atoms; no intra­molecular hydrogen bonds are formed
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