Suppression of FM-to-AM conversion in third-harmonic generation at the retracing point of a crystal

FM-to-AM conversion can cause many negative effects (e.g., reducing of margin against damage to the optics, and etc.) on performances of third-harmonic conversion system. In this letter, the FM-to-AM conversion effect in third-harmonic generation is investigated both at and away from the retracing point of type-II KDP crystal. Obtained results indicate that the FM-to-AM conversion can be suppressed effectively when the crystal works at the retracing point.Comment: 8 pages, 5 figures, 1 tabl

Laser-Induced Damage Initiation and Growth of Optical Materials

The lifetime of optical components is determined by the combination of laser-induced damage initiation probability and damage propagation rate during subsequent laser shots. This paper reviews both theoretical and experimental investigations on laser-induced damage initiation and growth at the surface of optics. The damage mechanism is generally considered as thermal absorption and electron avalanche, which play dominant roles for the different laser pulse durations. The typical damage morphology in the surface of components observed in experiments is also closely related to the damage mechanism. The damage crater in thermal absorption process, which can be estimated by thermal diffusion model, is typical distortion, melting, and ablation debris often with an elevated rim caused by melted material flow and resolidification. However, damage initiated by electron avalanche is often accompanied by generation of plasma, crush, and fracture, which can be explained by thermal explosion model. Damage growth at rear surface of components is extremely severe which can be explained by several models, such as fireball growth, impact crater, brittle fracture, and electric field enhancement. All the physical effects are not independent but mutually coupling. Developing theoretical models of multiphysics coupling are an important trend for future theoretical research. Meanwhile, more attention should be paid to integrated analysis both in theory and experiment

Mutations in the Human naked cuticle Homolog NKD1 Found in Colorectal Cancer Alter Wnt/Dvl/β-Catenin Signaling

BACKGROUND:Mutation of Wnt signal antagonists Apc or Axin activates beta-catenin signaling in many cancers including the majority of human colorectal adenocarcinomas. The phenotype of apc or axin mutation in the fruit fly Drosophila melanogaster is strikingly similar to that caused by mutation in the segment-polarity gene, naked cuticle (nkd). Nkd inhibits Wnt signaling by binding to the Dishevelled (Dsh/Dvl) family of scaffold proteins that link Wnt receptor activation to beta-catenin accumulation and TCF-dependent transcription, but human NKD genes have yet to be directly implicated in cancer. METHODOLOGY/PRINCIPAL FINDINGS:We identify for the first time mutations in NKD1--one of two human nkd homologs--in a subset of DNA mismatch repair-deficient colorectal tumors that are not known to harbor mutations in other Wnt-pathway genes. The mutant Nkd1 proteins are defective at inhibiting Wnt signaling; in addition, the mutant Nkd1 proteins stabilize beta-catenin and promote cell proliferation, in part due to a reduced ability of each mutant Nkd1 protein to bind and destabilize Dvl proteins. CONCLUSIONS/SIGNIFICANCE:Our data raise the hypothesis that specific NKD1 mutations promote Wnt-dependent tumorigenesis in a subset of DNA mismatch-repair-deficient colorectal adenocarcinomas and possibly other Wnt-signal driven human cancers

Research on EMP Environment of SG-III Facility

In the high power laser-target matter interaction process within the high power laser facility, the movement of hot electron can excite high power electromagnetic pulse with electric field amplitude up to 10,000 V/m and frequency of GHz level. The measurement  research and numerical simulation of the EM environment in high power laser facility SG III is introduced in this paper

Standing Wave Field Distribution in Graded-Index Antireflection Coatings

Standing wave field distributions in three classic types of graded-index antireflection coatings are studied. These graded-index antireflection coatings are designed at wavelengths from 200 nm to 1200 nm, which is the working wavelength range of high energy laser system for inertial-fusion research. The standing wave field distributions in these coatings are obtained by the numerical calculation of electromagnetic wave equation. We find that standing wave field distributions in these three graded-index anti-reflection coatings are quite different. For the coating with linear index distribution, intensity of standing wave field decreases periodically from surface to substrate with narrow oscillation range and the period is proportional to the incident wavelength. For the coating with exponential index distribution, intensity of standing wave field decreases periodically from surface to substrate with large oscillation range and the period is also proportional to the incident wavelength. Finally, for the coating with polynomial index, intensity of standing wave field is quickly falling down from surface to substrate without an obvious oscillation. We find that the intensity of standing wave field in the interface between coating and substrate for linear index, exponential index and polynomial index are about 0.7, 0.9 and 0.7, respectively. Our results indicate that the distributions of standing wave field in linear index coating and polynomial index coating are better than that in exponential index coating for the application in high energy laser system. Moreover, we find that the transmittance of linear index coating and polynomial index coating are also better than exponential index coating at the designed wavelength range. Present simulation results are useful for the design and application of graded-index antireflection coating in high energy laser system

UV-induced modification of fused silica: Insights from ReaxFF-based molecular dynamics simulations

This article discusses molecular dynamics simulations performed to present evidence that silica structure in both short and medium ranges is directly modified by UV-induced defects

Fabrication of Antireflective Nanostructures on a Transmission Grating Surface Using a One-Step Self-Masking Method

Suppression of Fresnel reflection from diffraction grating surfaces is very important for many optical configurations. In this work, we propose a simple method to fabricate subwavelength structures on fused-silica transmission grating for optical antireflection. The fabrication is a one-step self-masking reaction ion etching (RIE) process without using any masks. According to effective medium theory, random cone-shaped nanopillars which are integrated on the grating surface can act as an antireflective layer. Effects of the nanostructures on the reflection and transmission properties of the grating were investigated through experiments and simulations. The nanostructure surface exhibited excellent antireflection performance, where the reflection of the grating surface was suppressed to zero over a wide range of incident angles. Results also revealed that the etching process can change the duty cycle of the grating, and thus the diffraction orders if there are oblique lateral walls. The simulation results were in good agreement with the experimental ones, which verified our physical comprehension and the corresponding numerical model. The proposed method would offer a low-cost and convenient way to improve the antireflective performance of transmission-diffractive elements

Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process

The reactive ion etching (RIE) process of fused silica is often accompanied by surface contamination, which seriously degrades the ultraviolet laser damage performance of the optics. In this study, we find that the contamination behavior on the fused silica surface is very sensitive to the RIE process which can be significantly optimized by changing the plasma generating conditions such as discharge mode, etchant gas and electrode material. Additionally, an optimized RIE process is proposed to thoroughly remove polishing-introduced contamination and efficiently prevent the introduction of other contamination during the etching process. The research demonstrates the feasibility of improving the damage performance of fused silica optics by using the RIE technique