N,N'-Bis(methoxycarbonyl)-2,5-dilnethylhexane-2,5-dialnine

There are two nearly planar NHCOO groups in the title molecule (dimethyl 2,5-dimethyl-2,5-hexanediyldicarbamate, C12H24N204). The individual molecules in the crystal are linked by hydrogen bonds.published_or_final_versio

Bis[tris(tetrahydrofuran)lithium(1+)] bis(μ-diphenylphosphanido)bis(tetra-carbonylmolybdate)(2–)

In the dianion [Mo2(/z-PPh2)2(CO)8] 2-, two Mo centres are 4.100 (1)/ apart and are bridged asymmetrically by two diphenylphosphanido ligands. Each metal atom is also coordinated by four terminal CO ligands. There are strong interactions between the dianion and the two [Li(thf)3] + cations (thf = C4HsO). The Li ions are ligated by one equatorial carbonyl O atom from each Mo centre.published_or_final_versio

Triruthenium alkylidyne cluster complexes [H2Ru3(CO)9(μ3-CX)] (X=pyridine, 4-ethylpyridine)

Crystal structure analyses of nonacarbonyl-1K3C, - 2K3 C,3 K3 C-di-#-hydrido - l :2x2 H;2:3 K'-H-# 3-(pyrid-1- ylmethylidyne)-triangulo-triruthenium, [Ru3(#-H)2- (#3-C6HsN)(CO)9], (I), and nonacarbonyl-lK3C,- 2 K3C,3 K3C-# 3-[(4-ethylpyrid- 1 -yl)met hylidyne]-di- #-hydrido- l :2K2 H;2:3 x2 H-triangulo-triruthenium, [Ru3(#-H)2(#3-CsHgN)(CO)9], (II), reveal that both compounds consist of a triruthenium alkylidyne core with the nucleophiles [pyridine in (I) and 4-ethylpyridine in (II)] bonded to the #3-bridging alkylidyne C atom.published_or_final_versio

Sodium trans-Dicyano[N,N'-1,2-phenylenebis(2-pyridinecarboxamido)]cobaltate(III)

The Co atom in the [ColII(CN)2(CI8HI2N402)] - complex anion is hexacoordinate with a distorted octahedral geometry. The four N atoms in the amide ligand occupy equatorial positions and are coplanar to within 0.007A. The two CN groups are coordinated to Co in a trans configuration. The Na cation interacts with four complex anions through their cyanide-N and amide-O atoms, thereby adopting a distorted tetrahedral coordination.published_or_final_versio

2-Hydroxy-3-(p-nitrobenzenesulfonylamino)propylammonium p-nitrobenzenesulfonate

The title compound, [NO2C6H4SO2NHCH2CHOHCH2NH3]+- [p-NO2C6H4SO3]ÿ or C9H14N3O5S+ C6H4NO5Sÿ, was isolated from the reaction between 1,3-diamino-2-hydroxypropane and p-nitrobenzenesulfonyl chloride in CH2Cl2. The fairly extensive hydrogen-bond system involving all `active' H atoms links the ions in the crystal into layers normal to the b axis.published_or_final_versio

Quantification of image quality

Traditionally, the common window method is used to quantify image quality in optical lithography. The common window method can take dose variation. focus error, mask critical dimension error and aberrations into account. However, the demerit of the common window method is its computation time. In this paper, a new metric called Normalized Process Latitude (NPL) is proposed. The NPL considers dose variation, focus error, mask critical dimension error and aberrations to output its fmal quantification value. Its processing time for quantifying one feature is usually within 10 seconds on a PC with 1GHz CPU and 256MB DRAM. We perform several comparisons between the total window value and the NPL. It is found that the NPL draws similar conclusion as the total window. We can conclude that NPL is a sensible figure ofmerit for image quantification.published_or_final_versio

trans-Diehlorotetrapyridineruthenium(II)

[Ru(py)4Cl2] (where py = pyridine, CsHsN), crystallizes in the tetragonal space group I4/acd. Ru and C1 atoms occupy sites of 222 and 2 point symmetry, respectively. The Ru atom has slightly distorted octahedral coordination. The C1--Ru---C1 moiety is linear, as a result of symmetry requirements.published_or_final_versio

Feasibility of 50-nm device manufacture by 157-nm optical lithography: an initial assessment

The normalized process latitude (NPL) is used to assess the feasibility of 50-nm device manufacture by 157-nm optical lithography. A first NPL quantification assuming steady improvement of processing technology shows that 157-nm optical lithography is infeasible. A second NPL quantification investigates the amount of technology acceleration required to make 50-nm manufacture possible. It is concluded that photolithography is a viable lithography technique for the 50-nm technology generation only with significant improvements in focus control, photomask making, photoresist contrast, as well as aberration levels.published_or_final_versio

2(Phenylmethylthio)benzaldehyde

In the title compound, C14H12OS, the two planar benzaldehyde and benzyl groups are inclined at 77.7 (1) °. The torsion angle about the central C--S bond is 174.9 (2) °. The molecules are held together in the crystal by van der Waals interactions.published_or_final_versio

Electro-oxidation of methanol on Pt particles dispersed on RuO2 nanorods

The successful attachment of 1-3 nm Pt nanoparticles to the surface of amine-functional RuO2 nanorods through a simple, two-step chemically controlled procedure is reported here. The nanocomposites were characterized by transmission electron microscopy (TEM) and X-ray diffraction. TEM images showed that the monodispersed Pt nanoparticles were highly stable against thermal treatment. The electro-oxidation of methanol in sulfuric acidic solution was studied on RuO2-supported Pt nanoparticles by cyclic voltammetry and chronoamperometry. All of the electrochemical results show that RuO 2/Pt catalysts exhibit high activity for methanol oxidation that results from the high electroactive surface area of Pt nanoparticles and the effect of RuO2. These results demonstrate the feasibility of using metal oxide nanorods in certain fuel cell applications. © 2006 The Electrochemical Society. All rights reserved.published_or_final_versio