Nanofabrication by magnetic focusing of supersonic beams

We present a new method for nanoscale atom lithography. We propose the use of a supersonic atomic beam, which provides an extremely high-brightness and cold source of fast atoms. The atoms are to be focused onto a substrate using a thin magnetic film, into which apertures with widths on the order of 100 nm have been etched. Focused spot sizes near or below 10 nm, with focal lengths on the order of 10 microns, are predicted. This scheme is applicable both to precision patterning of surfaces with metastable atomic beams and to direct deposition of material.Comment: 4 pages, 3 figure

VUV-Spektroskopie an Ytterbium mit Laser- und Synchrotronstrahlung

SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekDEGerman