Electrochemical Oxidation Assessment and Interaction of 2-aminoethanol and N, N-diethylethanamine Propagation in Acidic Medium

Electro�oxidation and inhibitor performance of copper specimens in 1 M hydrochloric acid solu� tion was investigated at room temperature by linear potentiodynamic polarization and gravimetric method in the presence of 2�aminoethanol (A) and N, N�diethylethanamine (D) as an inorganic inhibitor. The effect of the inhibitory concentration on the corrosion behavior of copper was studied over 288 hrs at 298°K. The inhibitory efficiency rise up to 96% for single induced and 98% for synergistic behavior. The adsorption mechanism characteristic was supported by SEM/EDX analysis and adsorption isotherm. From all indica� tion, the inhibitive efficiency of these compounds majorly depends on their molecular structure and concen� tration. The blocking effects of the surface interface were also explained on the basis of the inhibitor active action. 2�aminoethanol and N, N�diethylethanamine inhibits copper in 1 M HCl by strictly affecting both the anodic and cathodic sites. Portion of the surface covered calculated was also found to follow Langmuir adsorption isotherm

Étude sur la corrosion du cuivre en milieu NaC1 0,5M et sa protection par des inhibiteurs organiques et des films polymères obtenus par électropolymérisation

Copper and its alloys are frequently used for electronic applications and for heat exchangers. They are subjected to increasingly severe corrosive conditions, for example the marine environment or the urban environment with high levels of pollution.Le cuivre et ses alliages sont fréquemment utilisés pour des applications électroniques et pour les échangeurs thermiques. Ils sont soumis à des conditions corrosives de plus en plus sévères, par exemple le milieu marin ou le milieu urbain avec des niveaux de pollution élevés

Étude sur la corrosion du cuivre en milieu NaCl 0,5M et sa protection par des inhibiteurs organiques et des films polymères obtenus par électropolymérisation

PARIS-BIUSJ-Thèses (751052125) / SudocCentre Technique Livre Ens. Sup. (774682301) / SudocPARIS-BIUSJ-Physique recherche (751052113) / SudocSudocFranceF

Corrosion inhibition of copper in chloride solution by triazole derivatives

In this paper we examined the inhibition of copper corrosion in aerated neutral chloride solution. The inhibitors studied are azole types. The present paper is limited to the results of the anodic behavior of copper. Using current potential curves we have selected two compounds presenting the best inhibiting effect. The inhibiting action of these two species has been examined with quartz crystal microbalance (EQCM) and impedance measurements in 0.5M NaCl solution. These results were compared with those determined with bare copper electrode. In the case of blank solution it was show that copper corrosion product is forming spontaneusly and may protect against corrosion. At 0.5 mM inhibitors form an inhibiting film resulting from products adsorption on copper area. The inhibitors reduce considerably anodic current densities and lead to the copper passivation in a large anodic potential range