Performance of an inverted sputter source

An inverted sputter source manufactured locally was installed on the Demokritos Tandem for heavy ion production. The source is utilizing as an extracted beam the negative ions that are found to be back streaming towards the ionizer in a regular sputter source. The source produces in sufficient quantities a number of ion species with rather few signs of ionizer erosion. Concerning the quality of the beam, direct comparison of the transmission through the accelerator of an oxygen beam produced by the sputter source and a diode source indicates the same percentage of transmission

Performance of an inverted sputter source

An inverted sputter source manufactured locally was installed on the Demokritos Tandem for heavy ion production. The source is utilizing as an extracted beam the negative ions that are found to be back streaming towards the ionizer in a regular sputter source. The source produces in sufficient quantities a number of ion species with rather few signs of ionizer erosion. Concerning the quality of the beam, direct comparison of the transmission through the accelerator of an oxygen beam produced by the sputter source and a diode source indicates the same percentage of transmission.Pour la production d'ions lourds, nous avons construit et installé sur l'accélérateur TANDEM de NRC Demokritos, une source sputtering renversée. Avec cette source les ions négatifs qui, dans les sources sputtering normales, vont vers l'ioniseur sont utilisés comme faisceau. La source produit un nombre d'ions lourds en quantité suffisante sans érosion significative de l'ioniseur. Pour comparer la qualité du faisceau, on a transmit un faisceau d'oxygène produit par la source renversée et la source diode. Le même pourcentage de transmission à travers l'accélérateur a été observé, indiquant une qualité de faisceau similaire pour les deux sources