Electrical Properties of the Layered Single Crystals TlGaSe2 and TlInS2

In the doped crystals TlGaSe2 and TlInS2, using method of temperature dependencies of DC resistance in the temperature range of 100 – 300 K, the phase transitions at the temperatures of 240 – 245 K and 105 – 120 K were observed. The AC conductance measurements at room temperature indicated the hopping mechanism of carrier transport in the studied samples

Effects of Fluences of Irradiation with 107 MeV Krypton Ions on the Recovery Charge of Silicon p+np^{+}n-Diodes

The diodes manufactured on the wafers of single-crystalline silicon uniformly doped with phosphorus are studied. The wafer resistivity was 90 Ω cm. Krypton ions are implanted to the side of the $p^{+}$-region of diodes (energy 107 MeV, fluence Φp from 5 × $10^7$ to 4 × $10^9 cm^{-2}$). It is shown that recovery charge $Q_{rr}$ is inversely proportional to the square root of the irradiation fluence value Φp. When the fluence increases, the part of the recovery charge Q_{rrA}, due to the high reverse conductance phase, decreases faster than the value $Q_{rr}$

Children\u27s Sensitivity to Pitch Variation in Language

Children acquire consonant and vowel categories by 12 months, but take much longer to learn to interpret perceptible variation. This dissertation considers children’s interpretation of pitch variation. Pitch operates, often simultaneously, at different levels of linguistic structure. English-learning children must disregard pitch at the lexical level—since English is not a tone language—while still attending to pitch for its other functions. Chapters 1 and 5 outline the learning problem and suggest ways children might solve it. Chapter 2 demonstrates that 2.5-year-olds know pitch cannot differentiate words in English. Chapter 3 finds that not until age 4–5 do children correctly interpret pitch cues to emotions. Chapter 4 demonstrates some sensitivity between 2.5 and 5 years to the pitch cue to lexical stress, but continuing difficulties at the older ages. These findings suggest a late trajectory for interpretation of prosodic variation; throughout, I propose explanations for this protracted time-course

Current-Voltage Characteristic Features of Diodes Irradiated with 170~MeV Xenon Ions

Diodes manufactured on the wafers of single-crystalline silicon uniformly doped with phosphorus are studied. The wafer resistivity was 90 Ω cm. Xenon ions were implanted into the diodes from the side of the $p^{+}$-region (implantation energy 170 MeV, fluence Φp from $5 \times 10^7$ to $10^9 cm^{-2}$). It is shown that the formation of a continuous irradiation damaged layer with the thickness of the order of magnitude of the average projective range creates prerequisites for the negative differential resistance in the current-voltage characteristics of the irradiated diodes

The Lifetime of Charge Carriers in Plates of Single Crystalline Silicon With Films of a Diazoquinon-Novolac Photoresist

Время жизни неравновесных носителей заряда τ в пластинах монокристаллического кремния с нанесенными на его поверхность пленками диазохинон-новолачного резиста марок ФП9120 и SPR700 измерялось фазовым методом с применением бесконтактной СВЧ-техники трехсантиметрового диапазона. Установлено, что в центре пластины значения времени жизни несколько выше, чем у края. Поверхностное время жизни τs было ниже объемного τv. Длительное хранение приводило к снижению времени жизни, наиболее выраженному в случае τs. Это связано, предположительно, с накоплением в кремниевой пластине быстро-диффундирующих глубоких примесей. Имплантация ионов бора и фосфора приводила к снижению значений τv, обусловленному нагревом (до ~70 oС) кремниевой пластины в процессе имплантации. Поверхностное время жизни τs в процессе облучения γ-квантами дозой выше 1 кГр снижается более интенсивно, чем объемное τv, что, вероятнее всего, связано с обрывом связей Si–O–C на границе раздела фоторезист/кремний.= The lifetime of nonequilibrium charge carriers τ in monocrystalline silicon wafers with films of diazoquinone- novolac resist FP9120 and SPR700 deposited on its surface was measured by the phase method using contactless microwave technology in the three-centimeter range. It was found that the lifetime values at the center of the plate are slightly higher than at the edge. The surface lifetime τs was lower than the bulk lifetime τv. Longterm storage led to a decrease in the lifetime, which was most pronounced in the case of τs. This is presumably due to the accumulation of fast-diffusing deep impurities in the silicon wafer. The implantation of boron and phosphorus ions led to a decrease in the values of τv due to heating (up to ~ 70 oС) of the silicon wafer during implantation. The surface lifetime τs during irradiation with γ-quanta with a dose higher than 1 kGy decreases more intensively than the bulk τv, which is most likely due to the breaking of Si–O–C bonds at the photoresist/silicon interface

Electrical Properties of the Layered Single Crystals TlGaSe2 and TlInS2

In the doped crystals TlGaSe2 and TlInS2, using method of temperature dependencies of DC resistance in the temperature range of 100 – 300 K, the phase transitions at the temperatures of 240 – 245 K and 105 – 120 K were observed. The AC conductance measurements at room temperature indicated the hopping mechanism of carrier transport in the studied samples

The Lifetime of Charge Carriers in Plates of Single Crystalline Silicon With Films of a Diazoquinon-Novolac Photoresist

Время жизни неравновесных носителей заряда τ в пластинах монокристаллического кремния с нанесенными на его поверхность пленками диазохинон-новолачного резиста марок ФП9120 и SPR700 измерялось фазовым методом с применением бесконтактной СВЧ-техники трехсантиметрового диапазона. Установлено, что в центре пластины значения времени жизни несколько выше, чем у края. Поверхностное время жизни τs было ниже объемного τv. Длительное хранение приводило к снижению времени жизни, наиболее выраженному в случае τs. Это связано, предположительно, с накоплением в кремниевой пластине быстро-диффундирующих глубоких примесей. Имплантация ионов бора и фосфора приводила к снижению значений τv, обусловленному нагревом (до ~70 oС) кремниевой пластины в процессе имплантации. Поверхностное время жизни τs в процессе облучения γ-квантами дозой выше 1 кГр снижается более интенсивно, чем объемное τv, что, вероятнее всего, связано с обрывом связей Si–O–C на границе раздела фоторезист/кремний.= The lifetime of nonequilibrium charge carriers τ in monocrystalline silicon wafers with films of diazoquinone- novolac resist FP9120 and SPR700 deposited on its surface was measured by the phase method using contactless microwave technology in the three-centimeter range. It was found that the lifetime values at the center of the plate are slightly higher than at the edge. The surface lifetime τs was lower than the bulk lifetime τv. Longterm storage led to a decrease in the lifetime, which was most pronounced in the case of τs. This is presumably due to the accumulation of fast-diffusing deep impurities in the silicon wafer. The implantation of boron and phosphorus ions led to a decrease in the values of τv due to heating (up to ~ 70 oС) of the silicon wafer during implantation. The surface lifetime τs during irradiation with γ-quanta with a dose higher than 1 kGy decreases more intensively than the bulk τv, which is most likely due to the breaking of Si–O–C bonds at the photoresist/silicon interface