3 research outputs found
Characterization of Fluoropolymer Resist for 157-nm Lithography
- Author
- Publication venue
- 'Technical Association of Photopolymers, Japan'
- Publication date
- 01/01/2003
- Field of study
A Study of an Organic Bottom Antireflective Coating for 157-nm Lithography
- Author
- D. Schmaljohann Y.C. Bae, G.L. Wei
- H. Ito G.M. Wallraff, P. Brock, N.
- J. Claypool R. Puligadda, J. Akers
- M. Toriumi S. Ishikawa, S. Miyoshi
- M.K. Crawford A.E. Feiring, J. Fel
- N. Shida H. Watanabe, T. Yamazaki,
- R.J. Hung H.V. Tran, B.C. Trinque,
- S. Kodama I. Kaneko, Y. Takebe, S.
- T.H. Fedynyshyn R.R. Kunz, R.F. Si
- Publication venue
- 'Technical Association of Photopolymers, Japan'
- Publication date
- 01/01/2003
- Field of study
Tetrafluoroethylene-based Fluoropolymers for 157-nm Resist Materials
- Author
- B.C. Trinque B.P. Osborn, C.R. Cha
- BAE Y C
- CHIBA T
- CRAWFORD M K
- DAMMEL R R
- FEDYNYSHYN T H
- G. Taylor C.B. Xu, G. Teng, J. Leo
- H. Ito Hoa D. Truong, M. Okazaki,
- ITO H
- KUNZ R R
- M. Koh T. Ishikawa, T. Araki, H. A
- M. Toriumi I. Satoh, and T. Itani
- M. Toriumi N. Shida, H. Watanabe,
- M. Toriumi S. Ishikawa, S. Miyoshi
- M. Toriumi T. Itani, J. Yamashita,
- M.K. Crawford A.E. Feiring, J. Fel
- M.K. Crawford A.E. Feiring, J. Fel
- N. Matsuzawa S. Mori, E. Yano, S.
- N. Shida H. Watanabe, T. Yamazaki,
- OBER C K
- R.R. Dammel R. Sakamuri, S.-H. Lee
- ROTHSCHILD M
- S. Kodama I. Kaneko, Y. Takebe, S.
- SCHMALJOHANN D
- T.H. Fedynyshyn R.R. Kunz, R.F. Si
- T.M. Bloomstein M. Rothschild, R.R
- TORIUMI M
- TRAN H V
- V.R. Vohra K. Douki, Y.-J. Kwark,
- Y. Uetani K. Hashimoto, Y. Miya, I
- Publication venue
- 'Technical Association of Photopolymers, Japan'
- Publication date
- 01/01/2003
- Field of study