An isogeometric analysis for elliptic homogenization problems

A novel and efficient approach which is based on the framework of isogeometric analysis for elliptic homogenization problems is proposed. These problems possess highly oscillating coefficients leading to extremely high computational expenses while using traditional finite element methods. The isogeometric analysis heterogeneous multiscale method (IGA-HMM) investigated in this paper is regarded as an alternative approach to the standard Finite Element Heterogeneous Multiscale Method (FE-HMM) which is currently an effective framework to solve these problems. The method utilizes non-uniform rational B-splines (NURBS) in both macro and micro levels instead of standard Lagrange basis. Beside the ability to describe exactly the geometry, it tremendously facilitates high-order macroscopic/microscopic discretizations thanks to the flexibility of refinement and degree elevation with an arbitrary continuity level provided by NURBS basis functions. A priori error estimates of the discretization error coming from macro and micro meshes and optimal micro refinement strategies for macro/micro NURBS basis functions of arbitrary orders are derived. Numerical results show the excellent performance of the proposed method

A Renormalization Group Improved Calculation of Top Quark Production near Threshold

The top quark cross section close to threshold in $e^+e^-$ annihilation is computed including the summation of logarithms of the velocity at next-to-next-to-leading-logarithmic order in QCD. The remaining theoretical uncertainty in the normalization of the total cross section is at the few percent level, an order of magnitude smaller than in previous next-to-next-to-leading order calculations. This uncertainty is smaller than the effects of a light standard model Higgs boson.Comment: changed figures, added reference

The Threshold t-tbar Cross Section at NNLL Order

The total cross section for top quark pair production close to threshold in e+e- annihilation is investigated. Details are given about the calculation at next-to-next-to-leading logarithmic order. The summation of logarithms leads to a convergent expansion for the normalization of the cross section, and small residual dependence on the subtraction parameter nu. A detailed analysis of the residual nu dependence is carried out. A conservative estimate for the remaining uncertainty in the normalization of the total cross section from QCD effects is $\lesssim \pm 3$. This makes precise extractions of the strong coupling and top width feasible, and further studies of electroweak effects mandatory.Comment: 33 pages, 11 figs, a program to produce the cross section will be available soo

Top Quark Pair Production close to Threshold: Top Mass, Width and Momentum Distribution

The complete NNLO QCD corrections to the total cross section $\sigma(e^+e^- \to Z*,\gamma*\to t\bar t)$ in the kinematic region close to the top-antitop threshold are calculated by solving the corresponding Schroedinger equations exactly in momentum space in a consistent momentum cutoff regularization scheme. The corrections coming from the same NNLO QCD effects to the top quark three-momentum distribution $d\sigma/d |\vec k_t|$ are determined. We discuss the origin of the large NNLO corrections to the peak position and the normalization of the total cross section observed in previous works and propose a new top mass definition, the 1S mass M_1S, which stabilizes the peak in the total cross section. If the influence of beamstrahlung and initial state radiation on the mass determination is small, a theoretical uncertainty on the 1S top mass measurement of 200 MeV from the total cross section at the linear collider seems possible. We discuss how well the 1S mass can be related to the $\bar{MS}$ mass. We propose a consistent way to implement the top quark width at NNLO by including electroweak effects into the NRQCD matching coefficients, which then can become complex.Comment: 53 pages, latex; minor changes, a number of typos correcte

Top quark mass definition and top quark pair production near threshold at the NLC

We suggest an infrared-insensitive quark mass, defined by subtracting the soft part of the quark self energy from the pole mass. We demonstrate the deep relation of this definition with the static quark-antiquark potential. At leading order in 1/m this mass coincides with the PS mass which is defined in a completely different manner. Going beyond static limit, the small normalization point introduces recoil corrections which are calculated here as well. Using this mass concept and other concepts for the quark mass we calculate the cross section of e+ e- -> t t-bar near threshold at NNLO accuracy adopting three alternative approaches, namely (1) fixing the pole mass, (2) fixing the PS mass, and (3) fixing the new mass which we call the PS-bar mass. We demonstrate that perturbative predictions for the cross section become much more stable if we use the PS or the PS-bar mass for the calculations. A careful analysis suggests that the top quark mass can be extracted from a threshold scan at NLC with an accuracy of about 100-200 MeV.Comment: published version, 21 pages in LaTeX including 11 PostScript figure

Running of the heavy quark production current and 1/k potential in QCD

The 1/k contribution to the heavy quark potential is first generated at one loop order in QCD. We compute the two loop anomalous dimension for this potential, and find that the renormalization group running is significant. The next-to-leading-log coefficient for the heavy quark production current near threshold is determined. The velocity renormalization group result includes the alpha_s^3 ln^2(alpha_s) ``non-renormalization group logarithms'' of Kniehl and Penin.Comment: 30 pages, journal versio

Bayesian inverse problems for recovering coefficients of two scale elliptic equations

We consider the Bayesian inverse homogenization problem of recovering the locally periodic two scale coefficient of a two scale elliptic equation, given limited noisy information on the solution. We consider both the uniform and the Gaussian prior probability measures. We use the two scale homogenized equation whose solution contains the solution of the homogenized equation which describes the macroscopic behaviour, and the corrector which encodes the microscopic behaviour. We approximate the posterior probability by a probability measure determined by the solution of the two scale homogenized equation. We show that the Hellinger distance of these measures converges to zero when the microscale converges to zero, and establish an explicit convergence rate when the solution of the two scale homogenized equation is sufficiently regular. Sampling the posterior measure by Markov Chain Monte Carlo (MCMC) method, instead of solving the two scale equation using fine mesh for each proposal with extremely high cost, we can solve the macroscopic two scale homogenized equation. Although this equation is posed in a high dimensional tensorized domain, it can be solved with essentially optimal complexity by the sparse tensor product finite element method, which reduces the computational complexity of the MCMC sampling method substantially. We show numerically that observations on the macrosopic behaviour alone are not sufficient to infer the microstructure. We need also observations on the corrector. Solving the two scale homogenized equation, we get both the solution to the homogenized equation and the corrector. Thus our method is particularly suitable for sampling the posterior measure of two scale coefficients

Re-orientation Transition in Molecular Thin Films: Potts Model with Dipolar Interaction

We study the low-temperature behavior and the phase transition of a thin film by Monte Carlo simulation. The thin film has a simple cubic lattice structure where each site is occupied by a Potts parameter which indicates the molecular orientation of the site. We take only three molecular orientations in this paper which correspond to the 3-state Potts model. The Hamiltonian of the system includes: (i) the exchange interaction $J_{ij}$ between nearest-neighbor sites $i$ and $j$ (ii) the long-range dipolar interaction of amplitude $D$ truncated at a cutoff distance $r_c$ (iii) a single-ion perpendicular anisotropy of amplitude $A$. We allow $J_{ij} =J_s$ between surface spins, and $J_{ij}=J$ otherwise. We show that the ground state depends on the the ratio $D/A$ and $r_c$. For a single layer, for a given $A$, there is a critical value $D_c$ below (above) which the ground-state (GS) configuration of molecular axes is perpendicular (parallel) to the film surface. When the temperature $T$ is increased, a re-orientation transition occurs near $D_c$: the low-$T$ in-plane ordering undergoes a transition to the perpendicular ordering at a finite $T$, below the transition to the paramagnetic phase. The same phenomenon is observed in the case of a film with a thickness. We show that the surface phase transition can occur below or above the bulk transition depending on the ratio $J_s/J$. Surface and bulk order parameters as well as other physical quantities are shown and discussed.Comment: 7 pages, 11 figures, submitted for publicatio

Development of a Prediction System for 3D Printed Part Deformation

The Additive Manufacturing (AM) process is applied in industrial applications. However, quality issues of the printed parts, including part distortion and cracks caused by high temperature and fast cooling, result in high residual stress. The theoretical calculation equation shows elastic behavior which is the linear behavior between strain and stress. However, in practice with the additive manufacturing process, strain and stress have nonlinear behavior. So, the prediction of the deformation of a printed part is inaccurate. The contribution of this research is the creation of an Inherent Strain (IS)-based part deformation prediction method during the Selective Laser Melting (SLM) process. To have the deformation in the design stage, we developed software for calculating the IS value and predicting the deformation. The difference between the calculated results and the experimental results is still there, so, we proposed an algorithm and developed an optimization module for the system to minimize this difference. In the final optimal printing process, the parameters are derived in order for the real printing process to have the required quality of the SLM printed part