Microholographic computer generated holograms for security applications: Microtags

We have developed a method for encoding phase and amplitude in microscopic computer-generated holograms (microtags) for security applications. Eight-by-eight-cell and 12 x 12-cell phase-only and phase-and-amplitude microtag designs has been exposed in photoresist using the extreme-ultraviolet (13.4 nm) lithography (EUVL) tool developed at Sandia National Laboratories. Using EUVL, we have also fabricated microtags consisting of 150-nm lines arranged to form 300-nm-period gratings. The microtags described in this report were designed for readout at 632.8 nm and 442 nm. The smallest microtag measures 56 {mu}m x 80 {mu}m when viewed at normal incidence. The largest microtag measures 80 by 160 microns and contains features 0.2 {mu}m wide. The microtag design process uses a modified iterative Fourier-transform algorithm to create either phase-only or phase-and-amplitude microtags. We also report on a simple and compact readout system for recording the diffraction pattern formed by a microtag. The measured diffraction patterns agree very well with predictions. We present the results of a rigorous coupled-wave analysis (RCWA) of microtags. Microtags are CD modeled as consisting of sub-wavelength gratings of a trapezoidal profile. Transverse-electric (TE) and TM readout polarizations are modeled. The objective of our analysis is the determination of optimal microtag-grating design parameter values and tolerances on those parameters. The parameters are grating wall-slope angle, grating duty cycle, grating depth, and metal-coating thickness. Optimal microtag-grating parameter values result in maximum diffraction efficiency. Maximum diffraction efficiency is calculated at 16% for microtag gratings in air and 12% for microtag gratings underneath a protective dielectric coating, within fabrication constraints. TM-microtag gratings. Finally, we suggest several additional microtag concepts, such as two-dimensional microtags and pixel-code microtags

Ring-field EUVL camera with large etendu

These scanning cameras with large instantaneous fields make efficient use of the new, 300 nm diameter, debris-less laser-plasma sources while printing 100 nm features

Mirror quality required by the Antares laser system

The Antares laser system is a large (100 kJ) CO/sub 2/ pulse laser operating at 10.6 ..mu..m. The system has 72 beam lines, each with an aperture of 900 cm/sup 2/. The system will be composed primarily of large copper-faced mirrors whose principal dimensions range up to 65 cm. These mirrors will be single-point diamond turned (SPOT) at the Y-12 facility of Union Carbide Corporation in Oak Ridge, Tennessee. we have had to develop surface quality specifications for these mirrors. These specifications were initially set at 50 nm peak-to-valley (p-v) surface error for the microsurface over 0.5-mm areas and 500 nm (p-v) over the whole mirror surface. An attempt has been made to refine these specifications to a more physically meaningful set based on the performance of the system. The optical specification for Antares is that 80% of the energy from each beam should be deliverable inside a 400-..mu..m circle. The diffraction limited focal spot is 160 ..mu..m across, so small amounts of low spatial frequency wavefront aberrations are acceptable. This is the figure error and can be represented by a best-fit fourth-order polynomial. It is specified separately from the higher spatial frequency subfigure errors that diffract light out of the 400-..mu..m circle

Alignment and focusing device for a multibeam laser system

Large inertial confinement fusion laser systems have many beams focusing on a small target. The Antares system is a 24-beam CO/sub 2/ pulse laser. To produce uniform illumination, the 24 beams must be individually focused on (or near) the target's surface in a symmetric pattern. To assess the quality of a given beam, we will locate a Smartt (point diffraction) interferometer at the desired focal point and illuminate it with an alignment laser. The resulting fringe pattern shows defocus, lateral misalignment, and beam aberrations; all of which can be minimized by tilting and translating the focusing mirror and the preceding flat mirror. The device described in this paper will remotely translate the Smartt interferometer to any position in the target space and point it in any direction using a two-axis gimbal. The fringes produced by the interferometer are relayed out of the target vacuum shell to a vidicon by a train or prisms. We are designing four separate snap-in heads to mount on the gimbal; two of which are Smartt interferometers (for 10.6 ..mu..m and 633 nm) and two for pinholes, should we wish to put an alignment beam backwards through the system

Simplified Velocity Interferometer System for Any Reflector (VISAR) system

A simplified, rugged VISAR (Velocity Interferometer System for Any Reflector) system has been developed using a non-removable delay element and an essentially non-adjustable interferometer cavity. In this system, the critical interference adjustments are performed during fabrication of the cavity, freeing the user from this task. Prototype systems are easy to use and give extremely high quality results. 6 refs., 7 figs

Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas

Laser Plasma Sources (LPSS) of extreme ultraviolet radiation are an attractive alternative to synchrotron radiation sources for extreme ultraviolet lithography (EUVL) due to their modularity, brightness, and modest size and cost. To fully exploit the extreme ultraviolet power emitted by such sources, it is necessary to capture the largest possible fraction of the source emission half-sphere while simultaneously optimizing the illumination stationarity and uniformity on the object mask. In this LDRD project, laser plasma source illumination systems for EUVL have been designed and then theoretically and experimentally characterized. Ellipsoidal condensers have been found to be simple yet extremely efficient condensers for small-field EUVL imaging systems. The effects of aberrations in such condensers on extreme ultraviolet (EUV) imaging have been studied with physical optics modeling. Lastly, the design of an efficient large-solid-angle condenser has been completed. It collects 50% of the available laser plasma source power at 14 nm and delivers it properly to the object mask in a wide-arc-field camera

Feasibility study of parallel optical correlation-decoding analysis of lightning

The optical correlator described in this report is intended to serve as an attention-focusing processor. The objective is to narrowly bracket the range of a parameter value that characterizes the correlator input. The input is a waveform collected by a satellite-borne receiver. In the correlator, this waveform is simultaneously correlated with an ensemble of ionosphere impulse-response functions, each corresponding to a different total-electron-count (TEC) value. We have found that correlation is an effective method of bracketing the range of TEC values likely to be represented by the input waveform. High accuracy in a computational sense is not required of the correlator. Binarization of the impulse-response functions and the input waveforms prior to correlation results in a lower correlation-peak-to-background-fluctuation (signal-to-noise) ratio than the peak that is obtained when all waveforms retain their grayscale values. The results presented in this report were obtained by means of an acousto-optic correlator previously developed at SNL as well as by simulation. An optical-processor architecture optimized for 1D correlation of long waveforms characteristic of this application is described. Discussions of correlator components, such as optics, acousto-optic cells, digital micromirror devices, laser diodes, and VCSELs are included

Antares alignment gimbal positioner

Antares is a 24-beam 40-TW carbon-dioxide (CO/sub 2/) laser fusion system currently under construction at the Los Alamos National Laboratory. The Antares alignment gimbal positioner (AGP) is an optomechanical instrument that will be used for target alignment and alignment of the 24 laser beams, as well as beam quality assessments. The AGP will be capable of providing pointing, focusing, and wavefront optical path difference, as well as aberration information at both helium-neon (He-Ne) and CO/sub 2/ wavelengths. It is designed to allow the laser beams to be aligned to any position within a 1-cm cube to a tolerance of 10 ..mu..m

Near perfect optics

This report discusses a novel fabrication process to produce nearly perfect optics. The process utilizes vacuum deposition techniques to optimally modify polished optical substrate surfaces. The surface figure, i.e. contour of a polished optical element, is improved by differentially filling in the low spots on the surface using flux from a physical vapor deposition source through an appropriate mask. The process is expected to enable the manufacture of diffraction-limited optical systems for the UV, extreme UV, and soft X-ray spectral regions, which would have great impact on photolithography and astronomy. This same technique may also reduce the fabrication cost of visible region optics with aspheric surfaces

Optimization of retardance for a complete Stokes polarimeter

The authors present two figures of merit based on singular value decomposition which can be used to assess the noise immunity of a complete Stokes polarimeter. These are used to optimize a polarimeter consisting of a rotatable retarder and fixed polarizer. A retardance of 132{degree} (approximately three eights wave) and retarder orientation angles of {+-}51.7{degree} and {+-}15.1{degree} are found to be optimal when four measurements are used. Use of this retardance affords a factor of 1.5 improvement in signal-to-noise ratio over systems employing a quarter wave plate. A geometric means of visualizing the optimization process is discussed, and the advantages of the use of additional measurements are investigated. No advantage of using retarder orientation angles spaced uniformly through 360{degree} is found over repeated measurements made at the four angles given previously