Use of electron beam lithography to selectively decompose metalorganics into patterned thin‐film superconductors

Fine line superconductors, approximately 5 μm in width and 260 nm thick, were formed from Y‐Ba‐Cu on 〈100〉SrTiO3 by the combined methods of metalorganic deposition and selective area electron beam exposure. The lines were written in metal neodecanoates using an electron beam having a spot size of 0.25 μm and an energy of 25 kV. The dosage of the exposure was 1200 μC/cm2. Unexposed areas were removed with a 30 s xylene wash. A 500 °C pyrolysis in air for 300 s followed by rapid thermal annealing in oxygen produced lines having superconducting onsets above 90 K and zero resistance at 69 K.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/70966/2/APPLAB-53-6-526-1.pd