Run ‐ to ‐Run Control of ITO Deposition Process

This paper describes the design and development of run‐to‐run control solution for an Indium Tin Oxide (ITO) deposition process. ITO deposition is an inherently complex process making it hard to simultaneously optimize the many characteristics of the ITO film such as optical transmission, resistivity, stresses in the film etc. With the run‐to‐run control solution, post‐process measurements made after every run are used along with empirical process models and drift compensation and noise rejection techniques to suggest new equipment settings for the next run. Theoretical models and simulation results show that this approach gives very stable ITO characteristics. Some of the methods that improve the control algorithm are discussed and future work is explored.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/92093/1/1.1833812.pd