Vapour pressure of tetra-tert-butyl substituted phthalocyanines

In this work, the results of mass spectrometric studies of the composition of gaseous phase under solid compounds of tetra-tert-butyl substituted phthalocyanines MPc(t-Bu)(4), with M = Cu(II), VO are presented. The vapour pressure of this phthalocyanine is determined as a function of temperature by the Knudsen effusion method, in which the rate of effusion of the equilibrium vapour through a small orifice is measured. It is shown that these tetra-tert-butyl-phthalocyanines exhibit higher volatility than their unsubstituted analogues. Such data are needed in order to improve the operating conditions of the growth of thin films by OMBD. The investigation of structural features of MPc(t-Bu)(4) films was carried out using UV-vis spectral and XRD data. (C) 2010 Elsevier B.V. All rights reserved

Volatile phthalocyanines: vapor pressure and thermodynamics

The current review summarizes the data of saturated vapor pressure and thermodynamic parameters of the sublimation process of different phthalocyanines as reported in the literature as well as in our work. The volatility of phthalocyanines is analyzed from the standpoint of their molecular and crystal structure. The differences in the saturated vapor pressure value of the investigated phthalocyanines may reach some orders of magnitude and are determined by the Van der Waals and electrostatic interaction of the peripheral atoms of adjacent molecules, as well as to a specific interaction, the type and number of which depend on the type of molecules packing in the crystal

(HFA)Cu . 1,5-COD as the prospective precursor for CVD-technologies : The electronic structure, thermodynamical properties and process of formation of thin copper films

The properties of (HFA)Cu . l,5-COD complex, being the prospective CVD-precursor for thin copper films for microelectronics, were investigated by UV (He 1) photoelectron, X-ray fluorescent spectroscopy and mass-spectroscopy together with ab initio calculations in approximation of density functional theory. The detailed analysis of energy and structure of highest occupied MO'S of (HFA)Cu . 1,5-COD was carried out. The thermodynamical and kinetical parameters of thermolysis reaction for (HFA)Cu . l,5-COD were determined and discussed. The initial stages of growth of thin copper films on the basis of this precursor (Si3N4 substrates) were studied by high-resolution transmission electron microscopy and X-ray photoelectron spectroscopy