Spectrophotometric Characterization of Thin Semi-Transparent Aluminum Films Prepared by Electron Beam Evaporation and Magnetron Sputtering

Aluminum thin films with thicknesses between approximately 10 and 60 nm have been deposited by evaporation and sputtering techniques. Layer characterization focused on reflectance, optical constants, and surface quality. Reflectance fits have been performed using a merger of three standard dispersion models, namely the Drude model, the Lorentzian oscillator model, and the beta-distributed oscillator model. A thickness dependence of the optical constants could be established in the investigated thickness range

Multifunctional contamination-resistant coatings

Surface contaminations can critically affect the performance of optical surfaces, in particular with respect to light scattering, optical losses, and laser stability. Thus, avoiding contaminations and reducing contamination-induced effects is of particular interest in the manufacturing of optical systems. By combining a specific thin film design with a tailored structural design, contamination-resistant coatings with a high optical quality can be realized. Most important is the balance of self-cleaningand light scattering-relevant surface roughness components

Multifunctional contamination-resistant coatings

Surface contaminations can critically affect the performance of optical surfaces, in particular with respect to light scattering, optical losses, and laser stability. Thus, avoiding contaminations and reducing contamination-induced effects is of particular interest in the manufacturing of optical systems. By combining a specific thin film design with a tailored structural design, contamination-resistant coatings with a high optical quality can be realized. Most important is the balance of self-cleaningand light scattering-relevant surface roughness components