Electron energy probability function and L-p similarity in low pressure inductively coupled bounded plasma

Particle-In-Cell (PIC) simulations are carried out to investigate the effect of discharge length (L) and pressure (p) on Electron Energy Probability Function (EEPF) in a low pressure radio frequency (rf) inductively coupled plasma (ICP) at 13.56 MHz. It is found that for both cases of varying L (0.1–0.5 m) and p (1–10 mTorr), the EEPF is a bi-Maxwellian with a step in the bounded direction (x) and non-Maxwellian with a hot tail in the symmetric unbounded directions (y, z). The plasma space potential decreases with increase in both L and p, the trapped electrons having energies in the range 0–20 eV. In a conventional discharge bounded in all directions, we infer that L and p are similarity parameters for low energy electrons trapped in the bulk plasma that have energies below the plasma space potential (eVp). The simulation results are consistent with a particle balance model

Stopping potential and ion beamlet control for micro-resistive patterning through sub-Debye length plasma apertures

Focused multiple ion beamlets from a microwave plasma source is investigated for localized micron-scale modification of substrates in a patterned manner. Plasma electrodes (PE) with an array of through apertures having aperture diameters of the order of plasma Debye length are investigated for generating the beamlets. Extraction through sub-Debye length apertures becomes possible when the PE is kept at floating potential. It is found that the current – voltage characteristics of the extracted beamlets exhibits interesting features such as a space-charge-limited region that has a different behaviour than the conventional Child-Langmuir’s law and an extraction-voltage-limited region that does not undergo saturation but exhibits a Schottky-like behaviour similar to that of a vacuum diode. A switching technique to control the motion of individual beamlets is developed and the stopping potential determined. The beamlets are thereafter used to create localized micro-resistive patterns. The experimental results are compared with simulations and reasonably good agreement is obtained

Surface wettability of an atomically heterogeneous system and the resulting intermolecular forces

We present the effect of 0.5 keV Ar+ beam irradiation on the wetting properties of metallic thin films. Observations reveal a transition from hydrophilic to hydrophobic nature at higher beam fluences which can be attributed to a reduction in net surface free energy. In this low-energy regime, ion beams do not induce significant surface roughness and chemical heterogeneity. However, they cause implantation of atomic impurities in the near surface region of the target and thus form a heterogeneous system at atomic length scales. Interestingly, the presence of implanted Ar atoms in the near surface region modifies the dispersive intermolecular interaction near the surface but induces no chemical modification due to their inert nature. On this basis, we have developed a theoretical model consistent with the experimental observations that reproduces the effective Hamaker constant with a reasonable accuracy